基于极紫外激光的光刻掩膜台式空中图像计量学

Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks.

作者信息

Brizuela Fernando, Carbajo Sergio, Sakdinawat Anne, Alessi David, Martz Dale H, Wang Yong, Luther Bradley, Goldberg Kenneth A, Mochi Iacopo, Attwood David T, La Fontaine Bruno, Rocca Jorge J, Menoni Carmen S

机构信息

National Science Foundation Engineering Research Center for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, CO 80523, USA.

出版信息

Opt Express. 2010 Jul 5;18(14):14467-73. doi: 10.1364/OE.18.014467.

DOI:10.1364/OE.18.014467

PMID:20639931

Abstract

We have realized the first demonstration of a table-top aerial imaging microscope capable of characterizing pattern and defect printability in extreme ultraviolet lithography masks. The microscope combines the output of a 13.2 nm wavelength, table-top, plasma-based, EUV laser with zone plate optics to mimic the imaging conditions of an EUV lithographic stepper. We have characterized the illumination of the system and performed line-edge roughness measurements on an EUVL mask. The results open a path for the development of a compact aerial imaging microscope for high-volume manufacturing.

摘要

我们已经实现了首次展示一种桌面式空中成像显微镜，它能够对极紫外光刻掩膜中的图案和缺陷可印刷性进行表征。该显微镜将波长为13.2纳米的桌面式基于等离子体的极紫外激光的输出与波带片光学元件相结合，以模拟极紫外光刻步进机的成像条件。我们已经对该系统的照明进行了表征，并在极紫外光刻掩膜上进行了线边缘粗糙度测量。这些结果为开发用于大规模制造的紧凑型空中成像显微镜开辟了一条道路。