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有机薄膜的和频光谱中的干涉效应。I. 理论建模与模拟。

Interference effects in the sum frequency generation spectra of thin organic films. I. Theoretical modeling and simulation.

机构信息

Catalysis Research Center, Hokkaido University, Sapporo 001-0021, Japan.

出版信息

J Chem Phys. 2010 Jul 21;133(3):034704. doi: 10.1063/1.3428668.

Abstract

A general theoretical calculation is described for predicting the interference effect in the sum frequency generation (SFG) spectra from a model thin-film system as a function of film thickness. The calculations were carried out for a three-layer thin film consisting of an organic monolayer, a dielectric thin film of variable thickness, and a gold substrate. This system comprises two sources of SFG, namely, a resonant contribution from the monolayer/dielectric film interface and a nonresonant contribution from the dielectric film/gold interface. The calculation shows that both the spectral intensity and the shape of the SFG spectra vary significantly with the thickness of the dielectric layer due to interference effects in the thin film. The intensity changes at a particular frequency were explained in terms of the changes in the local field factors (L factors) as a function of the dielectric film thickness. The L factor for each beam changes periodically with the thickness of the dielectric film. However, the combined L factor for the three beams shows complicated thickness dependent features and no clear periodicity was found. On the other hand, if the susceptibilities of both the resonant and nonresonant terms are fixed, changes in the spectral shape will be mainly due to changes in the phase differences between the two terms with the film thickness. The interference behavior also depends strongly on the polarization combinations of the sum frequency, visible, and infrared beams. A general method is provided for predicting changes in the spectral shapes at different film thicknesses by taking into account the relative intensities and phases of the SFG signals from the two interfaces. The model calculation provides important insights for understanding the nonlinear optical responses from any thin-film system and is an essential tool for quantitatively revealing the nonlinear susceptibilities, which are directly related to the actual structure of the interfacial molecules from the observed SFG spectra after quantitative removal of the L factors.

摘要

描述了一种通用的理论计算方法,用于预测模型薄膜系统中和频产生(SFG)光谱的干涉效应随薄膜厚度的变化。计算是针对由有机单层、可变厚度的介电薄膜和金基底组成的三层薄膜进行的。该系统包含两个 SFG 源,即来自单层/介电膜界面的共振贡献和来自介电膜/金界面的非共振贡献。计算表明,由于薄膜中的干涉效应,SFG 光谱的光谱强度和形状随介电层厚度的变化而显著变化。特定频率处的强度变化可以根据局部场因子(L 因子)随介电膜厚度的变化来解释。每个光束的 L 因子随介电膜厚度周期性变化。然而,三个光束的组合 L 因子表现出复杂的厚度相关特征,并且没有发现明显的周期性。另一方面,如果共振和非共振项的介电率固定,光谱形状的变化将主要归因于两个项之间的相位差随膜厚的变化。干涉行为还强烈依赖于和频、可见和红外光束的偏振组合。通过考虑两个界面处 SFG 信号的相对强度和相位,提供了一种预测不同膜厚下光谱形状变化的通用方法。该模型计算为理解任何薄膜系统的非线性光学响应提供了重要的见解,是定量揭示与界面分子实际结构直接相关的非线性介电率的重要工具,该介电率可从观察到的 SFG 光谱中通过定量去除 L 因子后直接获得。

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