Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China.
Chem Commun (Camb). 2010 Sep 21;46(35):6488-90. doi: 10.1039/c0cc01511c. Epub 2010 Aug 10.
By means of delicate and conventional methods based on photolithography and hot filament chemical vapor deposition (HFCVD) technology, a novel boron-doped diamond micro-network (BDDMN) film was fabricated, and this micro-structure showed excellent electrochemical sensing properties.
采用基于光刻和热丝化学气相沉积(HFCVD)技术的精细传统方法,制备了一种新型的硼掺杂金刚石微网络(BDDMN)薄膜,这种微结构表现出优异的电化学传感性能。