碳基底上烷基硫醇单分子层的形成与稳定性
The Formation and Stability of Alkylthiol Monolayers on Carbon Substrates.
作者信息
Lockett Matthew R, Smith Lloyd M
机构信息
Department of Chemistry, University of Wisconsin-Madison.
出版信息
J Phys Chem C Nanomater Interfaces. 2010 Jul 7;114(29):12635-12641. doi: 10.1021/jp102821x.
The formation and stability of alkylthiol monolayers on amorphous carbon thin films are investigated. Alkylthiol monolayers were prepared via a two-step, wet chemical process in which the carbon surface was first halogenated and then incubated with (4-(trifluoromethyl)phenyl)methanethiol (4tBM). The 4tBM covalently attaches to the surface in a substitution reaction in which the 4tBM thiol replaces the surface halogen. Studies of the substitution mechanism showed that monolayer formation is affected by the nature of the surface-bound halogen as well as the concentration and nucleophilicity of the 4tBM sulfur atom, consistent with a bimolecular (S(N)2) substitution reaction mechanism. The alkylthiol monolayers are stable over a wide range of solvent, pH, and temperature conditions.
研究了烷基硫醇单分子层在非晶碳薄膜上的形成和稳定性。烷基硫醇单分子层通过两步湿化学过程制备，其中碳表面首先进行卤化，然后与（4-（三氟甲基）苯基）甲硫醇（4tBM）孵育。4tBM通过取代反应共价连接到表面，其中4tBM硫醇取代表面卤素。取代机理研究表明，单分子层的形成受表面结合卤素的性质以及4tBM硫原子的浓度和亲核性的影响，这与双分子（S(N)2）取代反应机理一致。烷基硫醇单分子层在广泛的溶剂、pH和温度条件下都很稳定。
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