Collicott S H, Hesselink L
Appl Opt. 1992 Apr 1;31(10):1646-59. doi: 10.1364/AO.31.001646.
Two-dimensional velocity or displacement fields that are recorded as double-exposure speckle patterns may be measured with an anamorphic optical processor. The anamorphic optical processor measures one component of the velocity or displacement throughout a linear region of the double-exposure speckle pattern. The signal in the output plane of such a processor is a fringe pattern. An analysis to predict fringe modulation based on Fourier optics and the statistics of speckle patterns is developed. The analysis specifies the effects of both the speckle-recording optics and the anamorphic optical processor on the fringe modulation. The observed loss of modulation when the velocity or displacement component perpendicular to the measured component is increased is also described. Measurements of fringe modulations that are produced by anamorphic optical processors with and without increased tolerance to the perpendicular velocity component are compared to results of the analysis. Fringe modulation versus relative exposure in the double-exposure speckle pattern are also measured and compared to the results of this analysis. An anamorphic processor that reduces the time for digital processing of the fringe patterns by a factor of N (typically 128, 256, or 512) relative to the two-dimensional Fourier transform optical processor (with identical spatial resolution) is demonstrated.
以双曝光散斑图案记录的二维速度或位移场可以用变形光学处理器进行测量。变形光学处理器在双曝光散斑图案的线性区域内测量速度或位移的一个分量。这种处理器输出平面中的信号是一种条纹图案。基于傅里叶光学和散斑图案统计特性,开展了一种预测条纹调制的分析方法。该分析明确了散斑记录光学器件和变形光学处理器对条纹调制的影响。文中还描述了在垂直于测量分量的速度或位移分量增加时观察到的调制损失情况。将具有和不具有增加的垂直速度分量耐受性的变形光学处理器产生的条纹调制测量结果与分析结果进行了比较。还测量了双曝光散斑图案中条纹调制与相对曝光的关系,并与该分析结果进行了比较。展示了一种变形处理器,相对于二维傅里叶变换光学处理器(具有相同的空间分辨率),它将条纹图案的数字处理时间减少了N倍(通常为128、256或512)。