Department of Chemical and Materials Engineering, National Kaohsiung University of Applied Sciences, Kaohsiung 807, Taiwan.
Chem Commun (Camb). 2010 Oct 7;46(37):6968-70. doi: 10.1039/c0cc02180f. Epub 2010 Aug 23.
Nickel oxide film with open macropores prepared by anodic deposition in the presence of surfactant shows a very high capacitance of 1110 F g(-1) at a scan rate of 10 mV s(-1), and the capacitance value reduces to 950 F g(-1) at a high scan rate of 200 mV s(-1).
在存在表面活性剂的情况下通过阳极沉积制备的具有开放大孔的氧化镍薄膜在扫描速率为 10 mV s(-1) 时表现出非常高的电容 1110 F g(-1)，而在高扫描速率 200 mV s(-1) 时电容值降低至 950 F g(-1)。
