Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, 335 Gwahangno, Yuseong-gu, Daejeon 305-701, Korea.
Langmuir. 2010 Sep 7;26(17):14359-63. doi: 10.1021/la100414c.
The variously shaped gold patterns can be generated from the polydimethylsiloxane (PDMS) mold using line patterns by the capillary force lithography (CFL) process, which is a kind of nanoimprint method following the two-cycle method. After fabrication of micro- or nanosized line patterns at the first cycle, the patterned substrate is used as a substrate for the second cycle of CFL. When the other stamp is placed on the first pattern, rotated by a certain angle with respect to the first stamp, only the overlapped parts remained dot-shaped after the etching process. The various shapes and sizes of patterns can be produced by controlling the CFL conditions such as polymer thickness, reactive ion etching (RIE) time, and degree of rotation angle. The key advantage of the double imprint lithography method is to get the nanosized isolated dot-shaped patterns from microsized line patterns. If we fabricate nanosized isolated dot-shaped patterns directly, we should need predesigned patterns in the form of a master, which is generally prepared by a high-cost and time-consuming process such as E-beam lithography. The successful applications of large-area periodic patterns are nanoelectronic devices, nanoelectromechanical system (NEMS), and biosensors, the template of which is the master of nanoimprint lithography (NIL) and stamp fabrication in soft lithography.
各种形状的金图案可以通过毛细作用力光刻（CFL）工艺从聚二甲基硅氧烷（PDMS）模具中生成线图案，这是一种纳米压印方法，遵循双循环方法。在第一周期制造微或纳米线图案后，将图案化的基底用作第二周期 CFL 的基底。当另一个印章放置在第一图案上时，相对于第一印章旋转一定角度，仅在蚀刻过程后保留重叠部分为点状。通过控制聚合物厚度、反应离子刻蚀（RIE）时间和旋转角度等 CFL 条件，可以生产各种形状和尺寸的图案。双压印光刻法的关键优势在于能够从微尺寸线图案中获得纳米尺寸的孤立点状图案。如果我们直接制造纳米尺寸的孤立点状图案，我们应该需要预设计图案的主模板，通常通过电子束光刻等成本高且耗时的工艺来制备。大面积周期性图案的成功应用包括纳米电子器件、纳米机电系统（NEMS）和生物传感器，其模板是纳米压印光刻（NIL）和软光刻中印章制造的主模板。
