Kinoshita H, Kurihara K, Mizota T, Haga T, Takenaka H, Torii Y
Appl Opt. 1993 Dec 1;32(34):7079-83. doi: 10.1364/AO.32.007079.
A soft-x-ray projection lithography system is developed by the use of multilayer mirrors. To determine the feasibility of a high throughput and a large exposure area, we developed a reduction system that consists of two-aspherical-mirror optics. The figure errors of aspherical mirrors are evaluated by a laser interferometer. The rms aspherical figure errors of concave and convex mirrors are 8.8 and 2.0 nm, respectively, which are not enough to yield a resolution of 0.1 µm. The reduction optics is constructed by adjusting the mirror position to compensate for aberrations, and some trial replications are performed. An exposure area of larger than 10 mm × 0.6 mm with a fine pattern of less than a quarter micrometer is achieved.
利用多层反射镜开发了一种软X射线投影光刻系统。为了确定高通量和大曝光面积的可行性，我们开发了一种由双非球面镜光学系统组成的缩微系统。用激光干涉仪评估非球面镜的形状误差。凹面镜和凸面镜的均方根非球面形状误差分别为8.8纳米和2.0纳米，这不足以实现0.1微米的分辨率。通过调整反射镜位置来补偿像差构建缩微光学系统，并进行了一些试复制。实现了大于10毫米×0.6毫米的曝光面积以及小于四分之一微米的精细图案。
