Department of Physics and Center for Nanotechnology, Chung Yuan Christian University, Chung-Li 32023, Taiwan.
Phys Rev Lett. 2010 May 21;104(20):206803. doi: 10.1103/PhysRevLett.104.206803. Epub 2010 May 20.
To identify and investigate the mechanisms of electron-phonon (e-ph) relaxation in weakly disordered metallic conductors, we measure the electron dephasing rate in a series of suspended and supported 15-nm thick AuPd wires. In a wide temperature range, from ∼8 K to above 20 K, the e-ph interaction dominates in the dephasing processes. The corresponding relaxation rate reveals a quadratic temperature dependence, τ(e-ph)(-1)=A(ep)T2, where A(ep)≈5×10(9) K(-2) s(-1) is essentially the same for all samples studied. Our observations are shown to be in good agreement with the theory which predicts that, even in weakly disordered metallic structures at moderately low temperatures, the major mechanism of the e-ph relaxation is the electron scattering from vibrating defects and impurities.
为了识别和研究弱无序金属导体中电子-声子(e-ph)弛豫的机制,我们测量了一系列悬浮和支撑的 15nm 厚的 AuPd 线中的电子退相率。在很宽的温度范围内,从约 8 K 到 20K 以上,e-ph 相互作用在退相过程中占主导地位。相应的弛豫率呈现出二次温度依赖性,τ(e-ph)(-1)=A(ep)T2,其中 A(ep)≈5×10(9) K(-2) s(-1)对于所有研究的样品基本相同。我们的观察结果与理论预测非常吻合,即使在中等低温下的弱无序金属结构中,e-ph 弛豫的主要机制也是电子从振动的缺陷和杂质散射。