Sergeev A, Reizer M Yu, Mitin V
Research Foundation, University at Buffalo, Buffalo, New York 14260, USA.
Phys Rev Lett. 2005 Apr 8;94(13):136602. doi: 10.1103/PhysRevLett.94.136602.
We study the electron-phonon relaxation (dephasing) rate in disordered semiconductors and low-dimensional structures. The relaxation is determined by the interference of electron scattering via the deformation potential and elastic electron scattering from impurities and defects. We have found that in contrast with the destructive interference in metals, which results in the Pippard ineffectiveness condition for the electron-phonon interaction, the interference in semiconducting structures substantially enhances the effective electron-phonon coupling. The obtained results provide an explanation to energy relaxation in silicon structures.
我们研究了无序半导体和低维结构中的电子 - 声子弛豫(退相)速率。这种弛豫由通过形变势的电子散射与来自杂质和缺陷的弹性电子散射的干涉所决定。我们发现,与金属中导致电子 - 声子相互作用的皮帕德无效条件的相消干涉相反,半导体结构中的干涉显著增强了有效的电子 - 声子耦合。所得结果为硅结构中的能量弛豫提供了解释。