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水热法和热蒸发法合成纳米材料的电子束辐照损伤——以 ZnS 纳米结构为例。

The electron beam irradiation damage on nanomaterials synthesized by hydrothermal and thermal evaporation methods--an example of ZnS nanostructures.

机构信息

Heilongjiang Key Laboratory for Low-Dimensional System and Mesoscopic Physics, School of Physics and Electronic Engineering, Harbin Normal University, Harbin 150025, PR China.

出版信息

Micron. 2011 Apr;42(3):290-8. doi: 10.1016/j.micron.2010.09.009. Epub 2010 Oct 8.

DOI:10.1016/j.micron.2010.09.009
PMID:20965740
Abstract

Using transmission electron microscopy-related techniques, we have compared the degradation behaviors of several different types of ZnS nanostructures, including the ZnS nanosheets synthesized by hydrothermal method (with different oxygen impurity concentration) and ZnS nanobelts grown using thermal evaporation. We have identified that displacement damage, sputtering, and oxidation mechanisms exist during the electron irradiation process. While oxidation of the nanostructure is always observed, displacement damage appears to be the dominant mechanism contributing to the final structural collapse of ZnS nanosheets (synthesized via hydrothermal methods), but sputtering mechanism becomes critical in changing the surface roughness of the ZnS nanobelts (grown by thermal evaporation). The specific damage mechanisms of these nanomaterials disclose that different synthesis process results in different structure quality (particularly impurity related interior defects) of the ZnS nanostructures, which determines their specific degradation behaviors under the electron beam irradiation.

摘要

利用透射电子显微镜相关技术,我们比较了几种不同类型的 ZnS 纳米结构的降解行为,包括水热法合成的(具有不同氧杂质浓度)ZnS 纳米片和热蒸发生长的 ZnS 纳米带。我们已经确定,在电子辐照过程中存在位移损伤、溅射和氧化机制。虽然纳米结构的氧化总是被观察到,但位移损伤似乎是导致 ZnS 纳米片(通过水热法合成)最终结构崩溃的主要机制,但溅射机制在改变热蒸发生长的 ZnS 纳米带的表面粗糙度方面变得至关重要。这些纳米材料的具体损伤机制表明,不同的合成工艺导致 ZnS 纳米结构的结构质量(特别是与杂质有关的内部缺陷)不同,这决定了它们在电子束辐照下的特定降解行为。

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