Department of Physical and Organic Chemistry, Jozef Stefan Institute, Jamova 39, SI-1000 Ljubljana, Slovenia.
J Am Chem Soc. 2010 Nov 24;132(46):16657-68. doi: 10.1021/ja107704y. Epub 2010 Oct 29.
Three corrosion inhibitors for copper-3-amino-1,2,4-triazole (ATA), benzotriazole (BTAH), and 1-hydroxybenzotriazole (BTAOH)-were investigated by corrosion experiments and atomistic computer simulations. The trend of corrosion inhibition effectiveness of the three inhibitors on copper in near-neutral chloride solution is determined experimentally as BTAH ≳ ATA ≫ BTAOH. A careful analysis of the results of computer simulations based on density functional theory allowed to pinpoint the superior inhibiting action of BTAH and ATA as a result of their ability to form strong N-Cu chemical bonds in deprotonated form. While these bonds are not as strong as the Cl-Cu bonds, the presence of solvent favors the adsorption of inhibitor molecules onto the surface due to stronger solvation of the Cl(-) anions. Moreover, benzotriazole displays the largest affinity among the three inhibitors to form intermolecular aggregates, such as BTA-Cu polymeric complex. This is another factor contributing to the stability of the protective inhibitor film on the surface, thus making benzotriazole an outstanding corrosion inhibitor for copper. These findings cannot be anticipated on the basis of inhibitors' molecular electronic properties alone, thus emphasizing the importance of a rigorous modeling of the interactions between the components of the corrosion system in corrosion inhibition studies.
三位铜的缓蚀剂——3-氨基-1,2,4-三唑(ATA)、苯并三唑(BTAH)和1-羟基苯并三唑(BTAOH),通过腐蚀实验和原子计算机模拟进行了研究。在近中性氯化物溶液中,三种抑制剂对铜的腐蚀抑制效果的趋势,实验上确定为 BTAH ≳ ATA ≫ BTAOH。基于密度泛函理论的计算机模拟结果的仔细分析,使我们能够指出 BTAH 和 ATA 的优越抑制作用,因为它们能够以去质子化的形式形成强 N-Cu 化学键。虽然这些键不如 Cl-Cu 键强,但由于溶剂对 Cl(-)阴离子的更强溶剂化作用,溶剂的存在有利于抑制剂分子吸附到表面上。此外,苯并三唑在三种抑制剂中显示出形成分子间聚集体(如 BTA-Cu聚合复合物)的最大亲和力。这是保护抑制剂膜在表面上稳定的另一个因素,因此使苯并三唑成为铜的杰出缓蚀剂。仅根据抑制剂的分子电子性质,无法预测这些发现,因此在腐蚀抑制研究中强调了对腐蚀系统成分之间相互作用进行严格建模的重要性。