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作为高强度激光装置成像用X射线放大镜的非对称切割晶体对。

Asymmetrically cut crystal pair as x-ray magnifier for imaging at high intensity laser facilities.

作者信息

Szabo C I, Feldman U, Seely J F, Curry J J, Hudson L T, Henins A

机构信息

Artep Inc., 2922 Excelsior Spring Circle, Ellicott City, Maryland 21042, USA.

出版信息

Rev Sci Instrum. 2010 Oct;81(10):10E311. doi: 10.1063/1.3492382.

Abstract

The potential of an x-ray magnifier prepared from a pair of asymmetrically cut crystals is studied to explore high energy x-ray imaging capabilities at high intensity laser facilities. OMEGA-EP and NIF when irradiating mid and high Z targets can be a source of high-energy x-rays whose production mechanisms and use as backlighters are a subject of active research. This paper studies the properties and potential of existing asymmetric cut crystal pairs from the National Institute of Standards and Technology (NIST) built in a new enclosure for imaging x-ray sources. The technique of the x-ray magnifier has been described previously. This new approach is aimed to find a design that could be used at laser facilities by magnifying the x-ray source into a screen far away from the target chamber center, with fixed magnification defined by the crystals' lattice spacing and the asymmetry angles. The magnified image is monochromatic and the imaging wavelength is set by crystal asymmetry and incidence angles. First laboratory results are presented and discussed.

摘要

研究了由一对不对称切割晶体制成的X射线放大镜在高强度激光设施下探索高能X射线成像能力的潜力。OMEGA-EP和NIF在辐照中高Z靶时可成为高能X射线源,其产生机制以及用作背光源是当前活跃研究的课题。本文研究了美国国家标准与技术研究院(NIST)现有的不对称切割晶体对在新封装中用于X射线源成像的特性和潜力。X射线放大镜技术此前已有描述。这种新方法旨在找到一种可用于激光设施的设计,即将X射线源放大到远离靶室中心的屏幕上,放大倍数由晶体的晶格间距和不对称角确定。放大后的图像是单色的,成像波长由晶体的不对称性和入射角设定。给出并讨论了初步的实验室结果。

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