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用于玻璃表面表征的吸收映射

Absorption mapping for characterization of glass surfaces.

作者信息

Commandré M, Roche P, Borgogno J P, Albrand G

出版信息

Appl Opt. 1995 May 1;34(13):2372-9. doi: 10.1364/AO.34.002372.

DOI:10.1364/AO.34.002372
PMID:21037792
Abstract

The surface quality of bare substrates and preparation procedures take on an important role in optical coating performances. The most commonly used techniques of characterization generally give information about roughness and local defects. A photothermal deflection technique is used for mapping surface absorption of fused-silica and glass substrates. We show that absorption mapping gives specific information on surface contamination of bare substrates. We present experimental results concerning substrates prepared by different cleaning and polishing techniques. We show that highly polished surfaces lead to the lowest values of residual surface absorption. Moreover the cleaning behavior of surfaces of multicomponent glasses and their optical performance in terms of absorption are proved to be different from those of fused silica.

摘要

裸基板的表面质量和制备工艺对光学涂层性能起着重要作用。最常用的表征技术通常能提供有关粗糙度和局部缺陷的信息。一种光热偏转技术被用于绘制熔融石英和玻璃基板的表面吸收率。我们表明吸收率测绘能提供有关裸基板表面污染的特定信息。我们展示了关于通过不同清洁和抛光技术制备的基板的实验结果。我们表明高度抛光的表面会导致最低的残余表面吸收率。此外,多组分玻璃表面的清洁行为及其在吸收率方面的光学性能被证明与熔融石英不同。

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