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[紫外光/硅铁羟基氧化物/过氧化氢对水溶液中邻苯二甲酸二甲酯(DMP)的降解]

[Degradation of dimethyl phthalate (DMP) in aqueous solution by UV/Si-FeOOH/H2O2].

作者信息

Li Kun-Lin, Chen Wu-Qiang, Li Xiao-Ting, Yuan Bao-Ling

机构信息

State Key Laboratory Breeding Base of Photocatalysis, College of Civil Engineering, Fuzhou University, Fuzhou 350108, China.

出版信息

Huan Jing Ke Xue. 2010 Sep;31(9):2075-9.

PMID:21072926
Abstract

In this study the new catalyst Si-FeOOH was synthesized by adding Si to the traditional FeOOH and the mechanic strength of this new catalyst could be enhanced greatly. The photo-degradation of dimethyl phthalate (DMP) by UV/Si-FeOOH/H2O2 was investigated. The new catalyst Si-FeOOH was amorphous structure with high surface area and low soluble iron by XRD, IR and SEM. The efficiency of DMP degradation by UV/Si-FeOOH/H2O2 could reach 97% after 30 min reaction time at pH 5, 0.5 g/L dosage of Si-FeOOH, and 2.0 mmol/L of H2O2 under 125W UV365 irradiation. DMP could be degraded effectively by synergistic effect of UV, Si-FeOOH and H2O2. The Si-FeOOH photocatalyst can be very easily recovered and its catalytic activity also remained after several rounds of reaction.

摘要

在本研究中,通过向传统的氢氧化铁中添加硅合成了新型催化剂硅 - 氢氧化铁,该新型催化剂的机械强度可大大提高。研究了紫外光/硅 - 氢氧化铁/过氧化氢体系对邻苯二甲酸二甲酯(DMP)的光降解性能。通过X射线衍射(XRD)、红外光谱(IR)和扫描电子显微镜(SEM)分析表明,新型催化剂硅 - 氢氧化铁为无定形结构,具有高比表面积和低可溶性铁。在pH为5、硅 - 氢氧化铁投加量为0.5 g/L、过氧化氢浓度为2.0 mmol/L以及125W紫外光365照射下,反应30分钟后,紫外光/硅 - 氢氧化铁/过氧化氢体系对DMP的降解效率可达97%。通过紫外光、硅 - 氢氧化铁和过氧化氢的协同作用,DMP能够被有效降解。硅 - 氢氧化铁光催化剂很容易回收,并且经过几轮反应后其催化活性仍然保持。

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