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利用离子软着陆技术制备的有机金属配合物薄层中的氧化还原化学。

Redox chemistry in thin layers of organometallic complexes prepared using ion soft landing.

机构信息

Department of Physics, National Dong Hwa University, Hualien, 974, Taiwan, Republic of China.

出版信息

Phys Chem Chem Phys. 2011 Jan 7;13(1):267-75. doi: 10.1039/c0cp01457e. Epub 2010 Nov 12.

DOI:10.1039/c0cp01457e
PMID:21076748
Abstract

Soft landing (SL) of mass-selected ions is used to transfer catalytically-active metal complexes complete with organic ligands from the gas phase onto an inert surface. This is part of an effort to prepare materials with defined active sites and thus achieve molecular design of surfaces in a highly controlled way. Solution-phase electrochemical studies have shown that V(IV)O(salen) reacts in the presence of acid to form V(V)O(salen)(+) and the deoxygenated V(III)(salen)(+) complex-a key intermediate in the four electron reduction of O(2) by vanadium-salen. In this work, the V(V)O(salen)(+) and Ni(II)(salen) + H complexes were generated by electrospray ionization and mass-selected before being deposited onto an inert fluorinated self-assembled monolayer (FSAM) surface on gold. A time dependence study after ion deposition showed loss of O from V(V)O(salen)(+) forming V(III)(salen)(+) over a four-day period, indicating a slow interfacial reduction process. Similar results were obtained when other protonated molecules were co-deposited with V(V)O(salen)(+) on the FSAM surface. In all these experiments oxidation of the V(III)(salen)(+) product occurred upon exposure to oxygen or to air. The cyclic regeneration of V(V)O(salen)(+) upon exposure to molecular oxygen and its subsequent reduction to V(III)(salen)(+) in vacuum completes the catalytic cycle of O(2) reduction by the immobilized vanadium-salen species. Moreover, our results represent the first evidence of formation of reactive organometallic complexes on substrates in the absence of solvent. Remarkably, deoxygenation of the oxo-vanadium complex, previously observed only in highly acidic non-aqueous solvents, occurs on the surface in the UHV environment using an acid which is deposited into the inert monolayer. This acid can be a protonated metal complex, e.g. Ni(II)(salen) + H, or an organic acid such as protonated diaminododecane.

摘要

软着陆(SL)的质量选择离子被用来将催化活性的金属配合物连同有机配体从气相转移到惰性表面上。这是努力制备具有定义的活性位点的材料的一部分,从而以高度可控的方式实现表面的分子设计。溶液电化学研究表明,V(IV)O(salen)在酸的存在下反应,形成 V(V)O(salen)(+)和脱氧的 V(III)(salen)(+)配合物-钒-salen 四电子还原 O(2)的关键中间体。在这项工作中,V(V)O(salen)(+)和Ni(II)(salen) + H配合物通过电喷雾电离生成并在沉积到金上的惰性氟化自组装单层(FSAM)表面之前进行质量选择。离子沉积后的时间依赖性研究表明,V(V)O(salen)(+)中的 O 损失形成 V(III)(salen)(+),在四天内,表明界面还原过程缓慢。当其他质子化分子与 V(V)O(salen)(+)一起共沉积到 FSAM 表面时,得到了类似的结果。在所有这些实验中,V(III)(salen)(+)产物在暴露于氧气或空气中时都会被氧化。在暴露于分子氧后,V(V)O(salen)(+)的循环再生及其随后在真空中还原为 V(III)(salen)(+)完成了固定化钒-salen 物种还原 O(2)的催化循环。此外,我们的结果代表了在不存在溶剂的情况下在基底上形成反应性有机金属配合物的第一个证据。值得注意的是,在 UHV 环境中使用沉积到惰性单层中的酸,以前仅在高度酸性的非水溶剂中观察到的氧钒配合物的脱氧作用发生在表面上。这种酸可以是质子化的金属配合物,例如Ni(II)(salen) + H,也可以是质子化的二氨基十二烷等有机酸。

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