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基于计算化学的 h-MoS₂摩擦研究。第二部分。摩擦各向异性。

A computational chemistry study on friction of h-MoS₂. Part II. Friction anisotropy.

机构信息

Department of Applied Chemistry, Graduate School of Engineering, Tohoku University, 6-6-10-205 Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan.

出版信息

J Phys Chem B. 2010 Dec 9;114(48):15832-8. doi: 10.1021/jp1064775. Epub 2010 Nov 15.

Abstract

In this work, the friction anisotropy of hexagonal MoS(2) (a well-known lamellar compound) was theoretically investigated. A molecular dynamics method was adopted to study the dynamical friction of two-layered MoS(2) sheets at atomistic level. Rotational disorder was depicted by rotating one layer and was changed from 0° to 60°, in 5° intervals. The superimposed structures with misfit angle of 0° and 60° are commensurate, and others are incommensurate. Friction dynamics was simulated by applying an external pressure and a sliding speed to the model. During friction simulation, the incommensurate structures showed extremely low friction due to cancellation of the atomic force in the sliding direction, leading to smooth motion. On the other hand, in commensurate situations, all the atoms in the sliding part were overcoming the atoms in counterpart at the same time while the atomic forces were acted in the same direction, leading to 100 times larger friction than incommensurate situation. Thus, lubrication by MoS(2) strongly depended on its interlayer contacts in the atomic scale. According to part I of this paper [Onodera, T., et al. J. Phys. Chem. B 2009, 113, 16526-16536], interlayer sliding was source of friction reduction by MoS(2) and was originally derived by its material property (interlayer Coulombic interaction). In addition to this interlayer sliding, the rotational disorder was also important to achieve low friction state.

摘要

在这项工作中,我们从理论上研究了六方 MoS(2)(一种众所周知的层状化合物)的摩擦各向异性。采用分子动力学方法在原子水平上研究了双层 MoS(2)片的动态摩擦。通过旋转一层来描述旋转无序,并以 5°的间隔从 0°改变到 60°。叠加结构的失配角分别为 0°和 60°是协调的,其他则是不协调的。通过对模型施加外部压力和滑动速度来模拟摩擦动力学。在摩擦模拟过程中,由于在滑动方向上原子力的抵消,不协调结构表现出极低的摩擦力,导致平滑运动。另一方面,在协调情况下,滑动部分的所有原子同时克服对应部分的原子,而原子力作用在相同方向上,导致摩擦力比不协调情况大 100 倍。因此,MoS(2) 的润滑强烈依赖于其在原子尺度上的层间接触。根据本文的第一部分[Onodera, T., et al. J. Phys. Chem. B 2009, 113, 16526-16536],MoS(2) 通过其材料特性(层间库仑相互作用)减少层间滑动是摩擦减少的原因。除了这种层间滑动,旋转无序对于实现低摩擦状态也很重要。

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