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通过原位高分辨率透射电子显微镜验证金纳米触点中电迁移的解压模型。

Verification of unzipping models of electromigration in gold nanocontacts by in situ high-resolution transmission electron microscopy.

机构信息

Institute of Materials Science, University of Tsukuba, Tsukuba, Ibaraki, Japan.

出版信息

Nanotechnology. 2010 Dec 10;21(49):495706. doi: 10.1088/0957-4484/21/49/495706. Epub 2010 Nov 16.

Abstract

We observed in situ the electromigration process of gold (Au) nanocontacts (NCs) by high-resolution transmission electron microscopy. The structural dynamics of the interior and surfaces of the NCs were investigated at the atomic level. In particular, we directly verified the evidence of the unzipping model of electromigration with the in situ observation of surface-edge movement. The fundamental parameters of NCs, i.e., conductance and tensile force, were also measured during in situ lattice imaging of electromigration. Atoms migrating from the negative electrode accumulated at the most constricted regions of the NCs, leading to expansion. As a result, the NCs were compressed by the two electrodes. We demonstrated the magnitude of the force acting on the NCs during electromigration. The critical voltage of electromigration was approximately 80 mV, and the current density at the critical voltage was 60 TA m(-2). We found that Au nanogaps could be fabricated by applying this bias voltage to Au NCs.

摘要

我们通过高分辨率透射电子显微镜原位观察了金 (Au) 纳米触点 (NC) 的电迁移过程。在原子水平上研究了 NC 内部和表面的结构动力学。特别是,我们通过原位观察表面边缘运动,直接验证了电迁移解拉链模型的证据。在电迁移的原位晶格成像过程中,还测量了 NC 的基本参数,即电导和拉伸力。从负极迁移的原子在 NC 最狭窄的区域积累,导致膨胀。结果,NC 被两个电极压缩。我们证明了在电迁移过程中作用在 NC 上的力的大小。电迁移的临界电压约为 80 mV,临界电压下的电流密度为 60 TA m(-2)。我们发现,通过向 Au NC 施加这种偏置电压,可以制造 Au 纳米间隙。

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