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氧等离子体刻蚀诱导胶体光子晶体的晶格相变。

Oxygen plasma etching-induced crystalline lattice transformation of colloidal photonic crystals.

机构信息

Key Laboratory of Photochemistry, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China.

出版信息

J Am Chem Soc. 2010 Dec 15;132(49):17340-2. doi: 10.1021/ja106657t. Epub 2010 Nov 22.

DOI:10.1021/ja106657t
PMID:21090677
Abstract

This communication describes the transformation of a colloidal crystalline lattice that was realized via oxygen plasma etching of colloidal crystals made of SiO2@PMMA core-shell microspheres. The plasma etching of the colloidal crystals proceeded nonuniformly from the top to the bottom of the colloidal crystals. The PMMA shell was etched away by the oxygen plasma in a layer-by-layer manner, and the silica core was drawn into the pit formed by the neighboring spheres in the layer below. Consequently, the crystalline lattice was transformed while the order was maintained. Scanning electron microscopy images and reflection spectra further confirmed the change in the crystalline structures. Colloidal crystals with sc and bcc lattices can be fabricated if the ratio of the polymer shell thickness to the silica core diameter is equal to certain values. More importantly, this approach may be applicable to the fabrication of various assembly structures with different inorganic particles.

摘要

本文描述了一种通过氧等离子体刻蚀由 SiO2@PMMA 核壳微球组成的胶体晶体来实现胶体晶体晶格转变的方法。胶体晶体的等离子体刻蚀从胶体晶体的顶部到底部是非均匀进行的。PMMA 壳层被氧等离子体逐层刻蚀,而二氧化硅核则被拉入到下面相邻球体形成的凹坑中。因此,晶格在保持有序的情况下发生了转变。扫描电子显微镜图像和反射谱进一步证实了晶体结构的变化。如果聚合物壳层厚度与二氧化硅核直径的比值等于某些特定值,则可以制备出具有 sc 和 bcc 晶格的胶体晶体。更重要的是,这种方法可能适用于制备具有不同无机颗粒的各种组装结构。

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