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电沉积CoFe/Cu多层膜中Fe含量对结构、磁性和磁电阻特性的影响。

The effect of Fe content in electrodeposited CoFe/Cu multilayers on structural, magnetic and magnetoresistance characterizations.

作者信息

Tekgül Atakan, Alper Mürsel, Kockar Hakan, Safak Mürşide, Karaagac Oznur

机构信息

Department of Physics, Science and Literature Faculty, Uludag University, 16059 Görükle, Bursa, Turkey.

出版信息

J Nanosci Nanotechnol. 2010 Nov;10(11):7783-6. doi: 10.1166/jnn.2010.2882.

DOI:10.1166/jnn.2010.2882
PMID:21138032
Abstract

A series of CoFe/Cu multilayers were electrodeposited on Ti substrates from the electrolytes containing their metal ion under potentiostatic control, but the Fe concentration in the electrolytes was changed from 0.0125 M to 0.2 M. The deposition was carried out in a three-electrode cell at room temperature. The deposition of Cu layers was made at a cathode potential of -0.3 V with respect to saturated calomel electrode (SCE), while the ferromagnetic CoFe layers were deposited at -1.5 V versus SCE. The structural studies by X-ray diffraction revealed that the multilayers have face-centered-cubic structure. The magnetic characteristics of the films were investigated using a vibrating sample magnetometer and their easy-axis was found to be in film plane. Magnetoresistance measurements were carried out using the Van der Pauw method at room temperature with magnetic fields up to +/- 12 kOe. All multilayers exhibited giant magnetoresistance (GMR) and the GMR values up to 8% were obtained.

摘要

在恒电位控制下,从含有金属离子的电解液中,在钛基底上电沉积一系列CoFe/Cu多层膜,但电解液中铁的浓度从0.0125 M变化到0.2 M。沉积在室温下的三电极池中进行。相对于饱和甘汞电极(SCE),铜层在-0.3 V的阴极电位下沉积,而铁磁CoFe层在相对于SCE为-1.5 V时沉积。X射线衍射的结构研究表明,多层膜具有面心立方结构。使用振动样品磁强计研究了薄膜的磁特性,发现其易轴在薄膜平面内。在室温下,使用范德堡法在高达±12 kOe的磁场下进行磁电阻测量。所有多层膜均表现出巨磁电阻(GMR),并获得了高达8%的GMR值。

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