Kim S Y
Appl Opt. 1996 Dec 1;35(34):6703-7. doi: 10.1364/AO.35.006703.
The refractive index n(λ) and the extinction coefficient k(λ) of a TiO(2) film prepared by electron-beam evaporation are determined in the spectral region 1.5-5.5 eV. The transmission spectrum of the TiO(2) film on a vitreous silica specimen is inverted to get the k(λ) of TiO(2) in its interband transition region. Above 3.5 eV, k(λ) is used to get the coefficients of the quantum mechanically derived dispersion relation of an amorphous TiO(2). These coefficients and n(∞) are used to determine n(λ). The modeling procedure is applied to spectroscopic ellipsometry data of a TiO(2) film on a c-Si specimen, and the void distribution of the film is revealed. With spectroscopic ellipsometry data above the fundamental band gap, valuable information about surface roughness is obtained. The effective thickness of this rough surface layer is confirmed by an atomic force microscopy measurement.
通过电子束蒸发制备的TiO₂薄膜的折射率n(λ)和消光系数k(λ)在1.5 - 5.5 eV光谱区域内被测定。对玻璃二氧化硅样品上TiO₂薄膜的透射光谱进行反演，以得到TiO₂在其带间跃迁区域的k(λ)。在3.5 eV以上，k(λ)用于获得非晶TiO₂量子力学推导的色散关系系数。这些系数和n(∞)用于确定n(λ)。该建模过程应用于c-Si样品上TiO₂薄膜的光谱椭偏数据，并揭示了薄膜的孔隙分布。利用基本带隙以上的光谱椭偏数据，获得了有关表面粗糙度的有价值信息。通过原子力显微镜测量证实了该粗糙表面层的有效厚度。
