El Daif Ounsi, Drouard Emmanuel, Gomard Guillaume, Kaminski Anne, Fave Alain, Lemiti Mustapha, Ahn Sungmo, Kim Sihan, Roca I Cabarrocas Pere, Jeon Heonsu, Seassal Christian
Université de Lyon, Institut des Nanotechnologies de Lyon INL-UMR, CNRS, Ecole Centrale de Lyon, Ecully, France.
Opt Express. 2010 Sep 13;18 Suppl 3:A293-9. doi: 10.1364/OE.18.00A293.
We report on the absorption of a 100nm thick hydrogenated amorphous silicon layer patterned as a planar photonic crystal (PPC), using laser holography and reactive ion etching. Compared to an unpatterned layer, electromagnetic simulation and optical measurements both show a 50% increase of the absorption over the 0.38-0.75micron spectral range, in the case of a one-dimensional PPC. Such absorbing photonic crystals, combined with transparent and conductive layers, may be at the basis of new photovoltaic solar cells.
我们报道了利用激光全息术和反应离子刻蚀制备的图案化为平面光子晶体(PPC)的100纳米厚氢化非晶硅层的吸收情况。与未图案化的层相比,对于一维PPC,电磁模拟和光学测量均表明在0.38 - 0.75微米光谱范围内吸收增加了50%。这种吸收型光子晶体与透明导电层相结合,可能是新型光伏太阳能电池的基础。