Laboratoire Hubert Curien (UMR 5516 CNRS), Université de Lyon, Université Jean Monnet, Saint Etienne, France.
Opt Lett. 2011 Feb 1;36(3):325-7. doi: 10.1364/OL.36.000325.
Ultrafast laser processing of bulk transparent materials can significantly gain flexibility when the number of machining spots is increased. We present a photoinscription regime in which an array of regular dots is generated before the region of main laser focus under single-pulse exposure in fused silica and borosilicate crown glass without any external spatial phase modulation. The specific position of the dots does not rely on nonlinear propagation effects but is mainly determined by beam truncation and is explained by a Fresnel propagation formalism taking into account beam apodization and linear wavefront distortions at the air/glass interface. The photoinscription regime is employed to generate a two-dimensional array of dots in fused silica. We show that an additional phase modulation renders flexible the pattern geometry.
当加工点的数量增加时，使用超短激光处理块状透明材料可以显著提高灵活性。我们提出了一种光写入模式，在单脉冲曝光下，在熔融石英和硼硅酸盐冕玻璃中，在主激光焦点区域之前，在没有任何外部空间相位调制的情况下生成规则点的阵列。点的特定位置不依赖于非线性传播效应，而是主要取决于光束截断，并通过考虑光束变迹和空气/玻璃界面处线性波前变形的菲涅耳传播公式来解释。该光写入模式用于在熔融石英中生成二维点阵列。我们表明，附加的相位调制可使图案几何形状灵活可调。
