Jia Linghui, Yin Zuowei, Zhang Liang, Chen Xiangfei
Microwave-Photonics Technology Laboratory, Nanjing National Laboratory of Microstructures, School of Modern Engineering and Applied Sciences, Nanjing University, Nanjing, China.
Appl Opt. 2011 Feb 1;50(4):604-7. doi: 10.1364/AO.50.000604.
A special sampling structure based on double exposure technology is proposed to achieve dual-wavelength lasing in the distributed feedback fiber laser. This structure is composed of two grating pitches in one sampling period, which could be realized by changing the fiber's length in the fabrication. Through employing an equivalent phase shift, only a submicrometer-level precision is required for precise phase control. Then a stable dual-wavelength laser with the spacing of 400 pm is obtained in the experiment successfully. The output power is 30.46 μW and the sidemode suppression ratio is 46 dB under a pumped power of 146 mW.
提出了一种基于双曝光技术的特殊采样结构，以在分布反馈光纤激光器中实现双波长激光振荡。这种结构在一个采样周期内由两个光栅间距组成，这可以通过在制造过程中改变光纤长度来实现。通过采用等效相移，精确相位控制仅需要亚微米级的精度。然后在实验中成功获得了间距为400 pm的稳定双波长激光器。在146 mW的泵浦功率下，输出功率为30.46 μW，边模抑制比为46 dB。
