State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, ZhejiangUniversity, Hangzhou, China.
Phys Chem Chem Phys. 2011 Apr 7;13(13):5760-3. doi: 10.1039/c0cp00816h. Epub 2011 Feb 14.
Electrical conductivity of SnO(2)-based oxides is of great importance for their application as transparent conducting oxides (TCO) and gas sensors. In this paper, for the first time, an unusual enhancement in electrical conductivity was observed for SnO(2) films upon zinc doping. Films with Zn/(Zn + Sn) reaching 0.48 were grown by pulsed spray-evaporation chemical vapor deposition. X-Ray diffraction (XRD) shows that pure and zinc-doped SnO(2) films grow in the tetragonal rutile-type structure. Within the low doping concentration range, Zn leads to a significant decrease of the crystallite size and electrical resistivity. Increasing Zn doping concentration above Zn/(Zn + Sn) = 0.12 leads to an XRD-amorphous film with electrical resistivity below 0.015 Ω cm at room temperature. Optical measurements show transparencies above 80% in the visible spectral range for all films, and doping was shown to be efficient for the band gap tuning.
基于 SnO(2)的氧化物的电导率对于它们作为透明导电氧化物 (TCO) 和气体传感器的应用非常重要。在本文中,首次观察到锌掺杂的 SnO(2)薄膜的电导率异常增强。通过脉冲喷雾蒸发化学气相沉积法生长 Zn/(Zn + Sn)达到 0.48 的薄膜。X 射线衍射 (XRD) 表明,纯和锌掺杂的 SnO(2)薄膜以四方金红石型结构生长。在低掺杂浓度范围内,Zn 导致晶粒尺寸和电阻率显著降低。当 Zn 掺杂浓度超过 Zn/(Zn + Sn) = 0.12 时,室温下电阻率低于 0.015 Ω cm 的 XRD 非晶薄膜。光学测量表明,所有薄膜在可见光范围内的透光率均超过 80%,并且掺杂对于带隙调谐非常有效。