Zhao Chenguang, Tan Jiubin, Tang Jianbo, Liu Tao, Liu Jian
Center of Ultra-Precision Optoelectronic Instrument Engineering, Harbin Institute of Technology, China.
Appl Opt. 2011 Feb 10;50(5):655-61. doi: 10.1364/AO.50.000655.
In order to implement the ultraprecise measurement with large range and long working distance in confocal microscopy, confocal simultaneous phase-shifting interferometry (C-SPSI) has been presented. Four channel interference signals, with π/2 phase shift between each other, are detected simultaneously in C-SPSI. The actual surface height is then calculated by combining the optical sectioning with the phase unwrapping in the main cycle of the interference phase response, and the main cycle is determined using the bipolar property of differential confocal microscopy. Experimental results showed that 1 nm of axial depth resolution was achieved for either low- or high-NA objective lenses. The reflectivity disturbance resistibility of C-SPSI was demonstrated by imaging a typical microcircuit specimen. C-SPSI breaks through the restriction of low NA on the axial depth resolution of confocal microscopy effectively.
为了在共聚焦显微镜中实现大测量范围和长工作距离的超精密测量,提出了共聚焦同步相移干涉术(C-SPSI)。在C-SPSI中同时检测四个相互之间具有π/2相移的通道干涉信号。然后通过将光学切片与干涉相位响应主周期中的相位展开相结合来计算实际表面高度,并利用差分共聚焦显微镜的双极性特性确定主周期。实验结果表明,对于低数值孔径或高数值孔径物镜,轴向深度分辨率均达到了1 nm。通过对典型微电路样本成像,证明了C-SPSI的抗反射率干扰能力。C-SPSI有效地突破了低数值孔径对共聚焦显微镜轴向深度分辨率的限制。