Gwon Minji, Lee Eunsongyi, Kim Dong-Wook, Yee Ki-Ju, Lee Min Jung, Kim Youn Sang
Department of Physics, Ewha Womans University, Seoul, Korea.
Opt Express. 2011 Mar 28;19(7):5895-901. doi: 10.1364/OE.19.005895.
We investigated the optical properties of ZnO/Ag grating structures fabricated by sputtering and nanoimprint lithography. The grating structures exhibited multiple peak features in broad visible-range photoluminescence (PL) spectra. The PL intensity of the grating was larger than that of a planar thin film by up to two orders of magnitude. The surface plasmon (SP) dispersion relation suggested excitation of SPs with various energies of the grating, explaining the broad PL emission. The spectral dependence of the PL intensity was also well supported by the experimental reflectance spectra and the simulated electric field distribution at the ZnO/Ag interface.
我们研究了通过溅射和纳米压印光刻制备的ZnO/Ag光栅结构的光学特性。这些光栅结构在宽可见光范围的光致发光(PL)光谱中呈现出多个峰值特征。光栅的PL强度比平面薄膜的PL强度大两个数量级。表面等离子体(SP)色散关系表明,光栅具有各种能量的SP激发,这解释了宽PL发射。PL强度的光谱依赖性也得到了实验反射光谱和ZnO/Ag界面处模拟电场分布的有力支持。