Ge Weihao, Wang Chinhua, Xue Yinfei, Cao Bing, Zhang Baoshun, Xu Ke
Institute of Modern Optical Technologies and Key Laboratory of Advanced Optical Manufacturing Technologies of Jiangsu Province, Soochow University, Suzhou, China.
Opt Express. 2011 Mar 28;19(7):6714-23. doi: 10.1364/OE.19.006714.
Using numerical simulations, we report an observation of a novel tunable ultra-deep subwavelength nanolithography technique using a surface plasmon resonant cavity formed by a metallic grating and a metallic thin-film layer separated by a photoresist layer. The tuning capability is implemented by varying the cavity length, from which surface plasmon interferometric patterns with inherently higher optical resolution than that of conventional surface plasmon techniques are generated in the cavity of photoresist layer. The physical origin of the tunability is analytically confirmed by the dispersion relation derived from the cavity system.
通过数值模拟，我们报告了一种新型可调谐超深亚波长纳米光刻技术的观测结果，该技术利用由金属光栅和被光刻胶层隔开的金属薄膜层形成的表面等离子体共振腔。通过改变腔长来实现调谐能力，由此在光刻胶层的腔内产生具有比传统表面等离子体技术固有更高光学分辨率的表面等离子体干涉图案。通过从腔系统导出的色散关系，对可调谐性的物理起源进行了解析确认。
