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通过多循环生长方法合成高密度、大直径和定向排列的单壁碳纳米管。

Synthesis of high-density, large-diameter, and aligned single-walled carbon nanotubes by multiple-cycle growth methods.

机构信息

Department of Chemistry, Duke University, Durham, North Carolina 27708, United States.

出版信息

ACS Nano. 2011 May 24;5(5):3849-57. doi: 10.1021/nn200198b. Epub 2011 Apr 5.

DOI:10.1021/nn200198b
PMID:21452858
Abstract

A dense array of parallel single-walled carbon nanotubes (SWNTs) as the device channel can carry higher current, be more robust, and have smaller device-to-device variation, thus is more desirable for and compatible with applications in future highly integrated circuits when compared with single-tube devices. The density of the parallel SWNT arrays and the diameter of SWNTs both are key factors in the determination of the device performance. In this paper, we present a new multiple-cycle chemical vapor deposition (CVD) method to synthesize horizontally aligned arrays of SWNTs with densities of 20-40 SWNT/μm over large area and a diameter distribution of 2.4 ± 0.5 nm on the quartz surface based on a methanol/ethanol CVD method. The high nucleation efficiency of catalyst particles in multiple-cycle CVD processes has been demonstrated to be the main reason for the improvements in the density of SWNT arrays. More interestingly, we confirmed the existence of an etching effect, which strongly affects the final products in the multiple-cycle growth. This etching effect is likely the reason that only large-diameter SWNTs were obtained in the multiple-cycle CVD growth. Using these high-density and large-diameter nanotube arrays, two-terminal devices with back-gates were fabricated. The performances of these devices have been greatly improved in overall resistance and on-state current, which indicates these SWNT arrays have high potential for applications such as interconnects, high-frequency devices, and high-current transistors in future micro- or nanoelectronics.

摘要

高密度平行单壁碳纳米管(SWNTs)作为器件通道可以承载更高的电流,更健壮,器件间的变化更小,因此与单管器件相比,在未来高度集成的电路中更适合且更兼容应用。平行 SWNT 阵列的密度和 SWNT 的直径都是决定器件性能的关键因素。在本文中,我们提出了一种新的多周期化学气相沉积(CVD)方法,以基于甲醇/乙醇 CVD 方法在石英表面上合成具有 20-40 根/μm 密度和 2.4±0.5nm 直径分布的大面积水平排列的 SWNT 阵列。多周期 CVD 工艺中催化剂颗粒的高成核效率被证明是提高 SWNT 阵列密度的主要原因。更有趣的是,我们证实了存在一种蚀刻效应,它强烈影响多周期生长的最终产物。这种蚀刻效应可能是在多周期 CVD 生长中只能得到大直径 SWNTs 的原因。使用这些高密度和大直径的纳米管阵列,制造了具有背栅的两端器件。这些器件的性能在总电阻和导通电流方面都得到了极大的提高,这表明这些 SWNT 阵列在未来的微纳电子学中具有作为互连、高频器件和大电流晶体管的应用潜力。

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引用本文的文献

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