Department of Chemistry, University of Helsinki, P.O. Box 55, FIN-00014, Finland.
J Chem Phys. 2011 Mar 28;134(12):124307. doi: 10.1063/1.3570826.
We report on a new noble-gas molecule HXeOBr prepared in a low-temperature xenon matrix from the HBr and N(2)O precursors by UV photolysis and thermal annealing. This molecule is assigned with the help of deuteration experiments and ab initio calculations including anharmonic methods. The H-Xe stretching frequency of HXeOBr is observed at 1634 cm(-1), which is larger by 56 cm(-1) than the frequency of HXeOH identified previously. The experiments show a higher thermal stability of HXeOBr molecules in a xenon matrix compared to HXeOH.
我们报道了一种新的稀有气体分子 HXeOBr，它是通过 UV 光解和热退火从 HBr 和 N(2)O 前体制备的低温氙基质中得到的。通过氘化实验和包括非谐方法在内的从头算计算，帮助确定了该分子的结构。HXeOBr 的 H-Xe 伸缩频率在 1634 cm(-1)处被观测到，比之前确定的 HXeOH 的频率大 56 cm(-1)。实验表明，与 HXeOH 相比，HXeOBr 分子在氙基质中的热稳定性更高。
