UPMC Univ Paris 06 , UMR CNRS 7574, Laboratoire de Chimie de la Matière Condensée de Paris, Collège de France, 11 Place Marcellin Berthelot, F-75005 Paris, France.
ACS Appl Mater Interfaces. 2011 May;3(5):1624-32. doi: 10.1021/am2001746. Epub 2011 Apr 26.
Different types of amino acids have been used as additives to control the aqueous deposition of titanium dioxide thin films on single-crystal Si wafers. Thin titania films can be obtained through a chemical bath deposition (CBD) process using TiCl₄ as a precursor in an aqueous solution at temperatures below 100 °C. The addition of amino acids to the deposition solution was shown to reduce the thickness and roughness of the films and to increase their density. These protein building blocks were employed to modify the deposition rate as well as the size of aggregates that form the film. The thickness, crystallinity, morphology and composition of the grown films were characterized by a variety of techniques, including XRD, XPS, AFM and SEM. The consequences of the type of the amino acid additive (and its concentration in the solution) on the microstructural evolutions of the deposed films are thus revealed and discussed on the basis of the organic-inorganic interactions in solution and at the film surface.
不同类型的氨基酸被用作添加剂来控制二氧化钛薄膜在单晶硅片上的水相沉积。使用 TiCl4 作为前驱体，在低于 100°C 的温度下，通过化学浴沉积 (CBD) 工艺可以获得薄的 TiO2 薄膜。向沉积溶液中添加氨基酸可以降低薄膜的厚度和粗糙度，并提高其密度。这些蛋白质构建块被用来调节沉积速率以及形成薄膜的团聚体的大小。通过各种技术，包括 XRD、XPS、AFM 和 SEM，对生长薄膜的厚度、结晶度、形貌和组成进行了表征。因此，根据溶液中和薄膜表面的有机-无机相互作用，揭示并讨论了氨基酸添加剂的类型（及其在溶液中的浓度）对沉积薄膜微观结构演变的影响。
