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高级氧化工艺去除天然有机物的比较。

Comparison of advanced oxidation processes for the removal of natural organic matter.

机构信息

Department of Civil & Resource Engineering, Dalhousie University, Halifax, NS B3J 1Z1, Canada.

出版信息

Water Res. 2011 May;45(10):3263-9. doi: 10.1016/j.watres.2011.03.038. Epub 2011 Mar 29.

DOI:10.1016/j.watres.2011.03.038
PMID:21496860
Abstract

This study examined the impact of UV, ozone (O(3)), advanced oxidation processes (AOPs) including O(3)/UV, H(2)O(2)/UV H(2)O(2)/O(3) in the change of molecular weight distribution (MWD) and disinfection by-product formation potential (DBPFP). Bench-scale experiments were conducted with surface river water and changes in the UV absorbance at 254 nm (UV(254)), total organic carbon (TOC), trihalomethane and haloacetic acid formation potential (THMFP, HAAFP) and MWD of the raw and oxidized water were analyzed to evaluate treatment performance. Combination of O(3) and UV with H(2)O(2) was found to result in more TOC and UV(254) reduction than the individual processes. The O(3)/UV process was found to be the most effective AOP for NOM reduction, with TOC and UV(254) reduced by 31 and 88%, respectively. Application of O(3)/UV and H(2)O(2)/UV treatments to the source waters organics with 190-1500 Da molecular weight resulted in the near complete alteration of the molecular weight of NOM from >900 Da to <300 Da H(2)O(2)/UV was found to be the most effective treatment for the reduction of THM and HAA formation under uniform formation conditions. These results could hold particular significance for drinking water utilities with low alkalinity source waters that are investigating AOPs, as there are limited published studies that have evaluated the treatment efficacy of five different oxidation processes in parallel.

摘要

本研究考察了紫外线(UV)、臭氧(O3)、高级氧化工艺(AOPs),包括 O3/UV、H2O2/UV、H2O2/O3 在改变分子量分布(MWD)和消毒副产物生成潜能(DBPFP)方面的影响。采用表面河水进行了中试规模实验,分析了原水和氧化后水中的 254nm 紫外吸光度(UV254)、总有机碳(TOC)、三卤甲烷和卤乙酸生成潜能(THMFP、HAAFP)和 MWD 的变化,以评估处理效果。发现 O3 与 H2O2 结合与单独工艺相比,TOC 和 UV254 的去除效果更好。O3/UV 工艺是 NOM 去除最有效的 AOP,TOC 和 UV254 的去除率分别为 31%和 88%。O3/UV 和 H2O2/UV 处理对 190-1500Da 分子量的水源有机物的应用导致 NOM 的分子量几乎完全从>900Da 改变为<300Da。在均匀形成条件下,H2O2/UV 是降低 THM 和 HAA 形成的最有效处理方法。对于正在研究 AOP 的低碱度水源饮用水处理厂来说,这些结果可能具有特殊意义,因为很少有发表的研究同时评估了五种不同氧化工艺的处理效果。

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