School of Chemistry and ARC Centre of Excellence for Free Radical Chemistry and Biotechnology, University of Sydney, Sydney, New South Wales 2006, Australia.
J Phys Chem A. 2011 Jun 2;115(21):5496-504. doi: 10.1021/jp203108e. Epub 2011 May 6.
The effect of substituents on the strength of N-X (X = H, F, and Cl) bonds has been investigated using the high-level W2w thermochemical protocol. The substituents have been selected to be representative of the key functional groups that are likely to be of biological, synthetic, or industrial importance for these systems. We interpreted the effects through the calculation of relative N-X bond dissociation energies (BDE) or radical stabilization energies (RSE(NX)). The BDE and RSE(NX) values depend on stabilizing/destabilizing effects in both the reactant molecule and the product radical of the dissociation reactions. To assist us in the analysis of the substituent effects, a number of additional thermochemical quantities have been introduced, including molecule stabilization energies (MSE(NX)). We find that the RSE(NH) values are (a) increased by electron-donating alkyl substituents or the vinyl substituent, (b) increased in imines, and (c) decreased by electron-withdrawing substituents such as CF(3) and carbonyl moieties or through protonation. A different picture emerges when considering the RSE(NF) and RSE(NCl) values because of the electronegativities of the halogen atoms. The RSE(NX)s differ from the RSE(NH) values by an amount related to the stabilization of the N-halogenated molecules and given by MSE(NX). We find that substituents that stabilize/destabilize the radicals also tend to stabilize/destabilize the N-halogenated molecules. As a result, N-F- and N-Cl-containing molecules that include alkyl substituents or correspond to imines are generally associated with RSE(NF) and RSE(NCl) values that are less positive or more negative than the corresponding RSE(NH). In contrast, N-F- and N-Cl-containing molecules that include electron-withdrawing substituents or are protonated are generally associated with RSE(NF) and RSE(NCl) values that are more positive or less negative than the corresponding RSE(NH).
使用高精度 W2w 热化学方案研究了取代基对 N-X(X = H、F 和 Cl)键强度的影响。选择这些取代基是为了代表这些体系中可能具有生物、合成或工业重要性的关键官能团。我们通过计算相对 N-X 键离解能(BDE)或自由基稳定能(RSE(NX))来解释这些影响。BDE 和 RSE(NX)值取决于离解反应中反应物分子和产物自由基的稳定/不稳定效应。为了帮助我们分析取代基效应,引入了一些其他的热化学量,包括分子稳定能(MSE(NX))。我们发现,RSE(NH)值(a)被供电子烷基取代基或乙烯基取代基增加,(b)在亚胺中增加,(c)被吸电子取代基如 CF(3)和羰基部分或通过质子化减少。考虑到卤素原子的电负性,RSE(NF)和 RSE(NCl)值会出现不同的情况。RSE(NX)值与 RSE(NH)值的差异与 N-卤代分子的稳定化程度有关,由 MSE(NX)给出。我们发现,稳定/不稳定自由基的取代基也倾向于稳定/不稳定 N-卤代分子。因此,包含烷基取代基或对应于亚胺的含 N-F-和 N-Cl-的分子通常与 RSE(NF)和 RSE(NCl)值相关,这些值比相应的 RSE(NH)值更小或更大。相比之下,包含吸电子取代基或被质子化的含 N-F-和 N-Cl-的分子通常与 RSE(NF)和 RSE(NCl)值相关,这些值比相应的 RSE(NH)值更大或更小。