Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6493, USA.
Nano Lett. 2011 Jun 8;11(6):2478-85. doi: 10.1021/nl200921c. Epub 2011 May 9.
A nanoscale, synthetic perturbation was all that was required to nudge a natural, self-assembly process toward significantly higher order. Metallic thin film strips were transformed into nanoparticle arrays by nanosecond, liquid-phase dewetting. Arrays formed according to an evolving Rayleigh-Plateau instability, yet nanoparticle diameter and pitch were poorly controlled. However, by patterning a nanoscale sinusoid onto the original strip edge, a precise nanoparticle diameter and pitch emerged superseding the naturally evolving Rayleigh-Plateau instability.
纳米级的人为扰动就足以促使自然的自组装过程朝着更高阶的方向发展。通过纳秒级的液相去湿，金属薄膜条被转化为纳米粒子阵列。这些阵列是根据不断发展的瑞利-普兰特定律不稳定性形成的，但纳米粒子的直径和间距控制得很差。然而，通过在原始条带边缘上图案化纳米级正弦波，可以出现精确的纳米粒子直径和间距，从而取代自然演化的瑞利-普兰特定律不稳定性。
