Instituto de Nanociencia de Aragón, Universidad de Zaragoza, Zaragoza, Spain.
Nanotechnology. 2011 Jul 1;22(26):265304. doi: 10.1088/0957-4484/22/26/265304. Epub 2011 May 18.
Titanium is a relevant technological material due to its extraordinary mechanical and biocompatible properties, its nanopatterning being an increasingly important requirement in many applications. We report the successful nanopatterning of titanium by means of focused electron beam induced etching using XeF(2) as a precursor gas. Etch rates up to 1.25 × 10(-3) µm(3) s(-1) and minimum pattern sizes of 80 nm were obtained. Different etching parameters such as beam current, beam energy, dwell time and pixel spacing are systematically investigated, the etching process being optimized by decreasing both the beam current and the beam energy. The etching mechanism is investigated by transmission electron microscopy. Potential applications in nanotechnology are discussed.
钛因其出色的机械和生物相容性而成为一种相关的技术材料，其纳米图案化是许多应用中越来越重要的要求。我们报告了使用 XeF(2)作为前驱体气体通过聚焦电子束诱导刻蚀成功地对钛进行纳米图案化。获得了高达 1.25×10(-3) µm(3) s(-1)的刻蚀速率和 80nm 的最小图案尺寸。系统研究了不同的刻蚀参数，如电子束电流、电子束能量、停留时间和像素间距，通过降低电子束电流和电子束能量优化了刻蚀过程。通过透射电子显微镜研究了刻蚀机制。讨论了在纳米技术中的潜在应用。
