Department of Materials Science and Engineering, University of Illinois, Urbana, Illinois 61801, United States.
ACS Nano. 2011 Jun 28;5(6):5273-9. doi: 10.1021/nn201580z. Epub 2011 May 24.
Raman spectra of electrostatically gated single-layer graphene are measured from room temperature to 560 K to sort out doping and thermally induced effects. Repeated heating cycles under Ar led to convergent first-order temperature coefficients of the G-band (χ(G) = -0.03 cm(-1)/K) and the 2D-band (χ(2D) = -0.05 cm(-1)/K) frequencies, which are independent of doping level as long as the Fermi level does not shift with temperature. While the intrinsic behavior may be different (e.g., χ(G) ∼ -0.02 cm(-1)/K near room temperature), these values appear more appropriate in describing responses of most graphene samples on SiO(2) substrates. The more negative χ(G) value than theoretical expectations may be explained by interactions with the substrate reducing the lattice thermal expansion contribution to the temperature dependence of G-band frequency. Enhanced interactions with the substrate may also be responsible for zero-charge, room-temperature G-band line width increase and 2D-band frequency downshift.
从室温到 560 K 测量了静电门控单层石墨烯的拉曼光谱,以区分掺杂和热诱导效应。在 Ar 下进行重复加热循环导致 G 带((χ(G)) = -0.03 cm^(-1)/K)和 2D 带((χ(2D)) = -0.05 cm^(-1)/K)频率的一阶温度系数收敛,只要费米能级不随温度移动,这些系数就与掺杂水平无关。虽然本征行为可能不同(例如,室温附近(χ(G)∼-0.02 cm^(-1)/K)),但这些值在描述大多数在 SiO_2 衬底上的石墨烯样品的响应时似乎更合适。比理论预期更负的(χ(G))值可能是由于与衬底的相互作用降低了晶格热膨胀对 G 带频率温度依赖性的贡献。与衬底的增强相互作用也可能导致零电荷、室温下 G 带线宽增加和 2D 带频率下移。