Department of Chemistry, Purdue University, 560 Oval Drive, West Lafayette, IN 47907, USA.
J Chromatogr A. 2011 Aug 5;1218(31):5131-5. doi: 10.1016/j.chroma.2011.05.080. Epub 2011 Jun 1.
Non-porous, colloidal silica particles were annealed at three different temperatures, 800, 900 and 1050 °C. The adsorption of lysozyme, a probe of surface roughness, was consistent with progressively reduced surface roughness as temperature increased. The heat treated silica particles were rehydroxylated and then used to pack UHPLC columns. The cationic protein lysozyme was used to probe silanol activity, which exhibited progressively less tailing as the annealing temperature increased. FTIR spectroscopy confirmed that the abundance of isolated silanols on the surface was reduced by annealing at 900 °C or 1050 °C. FTIR also revealed that there was markedly increased hydrogen bonding of the isolated silanols to neighbors after rehydroxylation. These results combine to support the hypothesis that (a) isolated silanols on silica cause tailing in RP-LC and (b) nonplanar topography gives rise to isolated silanols.
无孔、胶体二氧化硅颗粒在三种不同温度下进行退火处理,温度分别为 800、900 和 1050°C。溶菌酶(一种表面粗糙度探针)的吸附情况表明,随着温度的升高,表面粗糙度逐渐降低。经过热处理的二氧化硅颗粒重新水合,然后用于填充 UHPLC 柱。阳离子蛋白溶菌酶用于探测硅醇活性,随着退火温度的升高,峰尾逐渐减少。傅里叶变换红外(FTIR)光谱证实,在 900°C 或 1050°C 退火时,表面上孤立硅醇的丰度减少。FTIR 还表明,在重新水合后,孤立硅醇与相邻的氢键显著增加。这些结果共同支持以下假设:(a)硅胶上的孤立硅醇导致反相高效液相色谱(RP-LC)中的峰尾,(b)非平面形貌导致孤立硅醇的产生。