Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ, UK.
J Phys Condens Matter. 2011 Aug 3;23(30):305002. doi: 10.1088/0953-8984/23/30/305002. Epub 2011 Jun 28.
We show the influence of pulsed laser deposition fluence on the transport properties of the LaAlO(3)/SrTiO(3) (LAO/STO) heterointerface. Structural characterization by x-ray diffraction and medium energy ion spectrometry enables us to deduce that the electronic behaviour is extremely sensitive to the stoichiometry of the LAO layer as well as the structural quality of the STO surface. An optimum balance of these two quantities is demonstrated for an intermediate laser fluence.
我们展示了脉冲激光沉积能量密度对 LaAlO(3)/SrTiO(3)（LAO/STO）异质界面输运性质的影响。通过 X 射线衍射和中等能量离子谱学的结构表征，我们推断出电子行为对 LAO 层的化学计量和 STO 表面的结构质量极其敏感。对于中间激光能量密度，这两个量的最佳平衡得到了证明。
