Department of Materials Science and Engineering, Korea University, Anam-dong 5-ga, Seongbuk-gu, Seoul 136-713, South Korea.
Nanoscale Res Lett. 2011 Jul 18;6(1):458. doi: 10.1186/1556-276X-6-458.
UV curing nanoimprint lithography is one of the most promising techniques for the fabrication of micro- to nano-sized patterns on various substrates with high throughput and a low production cost. The UV nanoimprint process requires a transparent template with micro- to nano-sized surface protrusions, having a low surface energy and good flexibility. Therefore, the development of low-cost, transparent, and flexible templates is essential. In this study, a flexible polyethylene terephthalate (PET) film coated with a fluorinated polymer material was used as an imprinting mold. Micro- and nano-sized surface protrusion patterns were formed on the fluorinated polymer layer by the hot embossing process from a Si master template. Then, the replicated pattern of the fluorinated polymer, coated on the flexible PET film, was used as a template for the UV nanoimprint process without any anti-stiction coating process. In this way, the micro- to nano-sized patterns of the original master Si template were replicated on various substrates, including a flat Si substrate and curved acryl substrate, with high fidelity using UV nanoimprint lithography.
紫外光固化纳米压印光刻技术是一种极具前途的技术,可以在各种衬底上高速、低成本地制造微纳米级图案。紫外光纳米压印过程需要一个具有微纳米级表面凸起的透明模板,其具有低表面能和良好的柔韧性。因此,开发低成本、透明和灵活的模板至关重要。在本研究中,使用涂覆有氟化聚合物材料的柔性聚对苯二甲酸乙二醇酯(PET)薄膜作为压印模具。通过从 Si 主模板进行热压印工艺,在氟化聚合物层上形成微纳米级表面凸起图案。然后,涂覆在柔性 PET 薄膜上的氟化聚合物的复制图案用作 UV 纳米压印工艺的模板,而无需任何防粘涂层工艺。通过这种方式,使用 UV 纳米压印光刻技术,各种衬底(包括平坦的 Si 衬底和弯曲的亚克力衬底)上的原始 Si 主模板的微纳米级图案被高保真度地复制。