四方相极Nd 掺杂 BiFeO3 薄膜生长在 MgO 衬底上。
Orthorhombic polar Nd-doped BiFeO3 thin film on MgO substrate.
机构信息
Laboratoire Structures, Propriétés et Modélisation des Solides, UMR CNRS-École Centrale Paris, 92295 Châtenay-Malabry Cedex, France.
出版信息
J Phys Condens Matter. 2011 Aug 24;23(33):332201. doi: 10.1088/0953-8984/23/33/332201. Epub 2011 Jul 21.
A Nd-doped BiFeO(3) thin film deposited on MgO substrate was studied by synchrotron diffraction. The ferroelectric nature of the film is proven by in-plane remanent polarization measurement. The highest possible symmetry of the film is determined to be orthorhombic, within the Fm2m space group. Such a structure is rotated by 45° with respect to the substrate and is consistent with tilts of oxygen octahedra doubling the unit cell. This polar structure presents a rather unusual strain-accommodation mechanism.
采用同步辐射衍射研究了沉积在 MgO 衬底上的掺 Nd 的 BiFeO(3) 薄膜。通过面内剩余极化测量证明了薄膜的铁电性质。确定薄膜的最高可能对称性为正交，属于 Fm2m 空间群。这种结构相对于衬底旋转了 45°，与氧八面体的倾斜一致，使单位晶胞加倍。这种极结构呈现出一种相当不寻常的应变适应机制。
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