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通过采用单芯片生长提高基于氮化铟镓的多量子阱发光二极管的光提取效率。

Improved light extraction efficiency of InGaN-based multi-quantum well light emitting diodes by using a single die growth.

作者信息

Park Min Joo, Kwon K W, Kim Y H, Park S H, Kwak Joon Seop

机构信息

Department of Printed Electronics Engineering, Sunchon National University, Jeonnam 540-742, Korea.

出版信息

J Nanosci Nanotechnol. 2011 May;11(5):4484-7. doi: 10.1166/jnn.2011.3703.

Abstract

We have demonstrated that the light extraction efficiency of the InGaN based multi-quantum well light-emitting diodes (LEDs) can be improved by using a single die growth (SDG) method. The SDG was performed by patterning the n-GaN and sapphire substrate with a size of single chip (600 x 250 microm2) by using a laser scriber, followed by the regrowth of the n-GaN and LED structures on the laser patterned n-GaN. We fabricated lateral LED chips having the SDG structures (SDG-LEDs), in which the thickness of the regrown n-GaN was varied from 2 to 6 microm. For comparison, we also fabricated conventional LED chips without the SDG structures. The SDG-LEDs showed lower operating voltage when compared to the conventional LEDs. In addition, the output power of the SDG-LEDs was significantly higher than that of the conventional LEDs. From optical ray tracing simulations, the increase in the thickness and sidewall angle of the regrown n-GaN and LED structures may enhance photon escapes from the tilted facets of the regrown n-GaN, followed by the increase in light output power and extraction efficiency of the SDG-LEDs.

摘要

我们已经证明,通过使用单芯片生长(SDG)方法可以提高基于InGaN的多量子阱发光二极管(LED)的光提取效率。SDG是通过使用激光划片机对尺寸为单芯片(600×250微米²)的n-GaN和蓝宝石衬底进行图案化,然后在激光图案化的n-GaN上重新生长n-GaN和LED结构来实现的。我们制造了具有SDG结构的横向LED芯片(SDG-LED),其中重新生长的n-GaN的厚度在2到6微米之间变化。为了进行比较,我们还制造了没有SDG结构的传统LED芯片。与传统LED相比,SDG-LED显示出更低的工作电压。此外,SDG-LED的输出功率明显高于传统LED。通过光线追踪模拟,重新生长的n-GaN和LED结构的厚度和侧壁角度的增加可能会增强光子从重新生长的n-GaN的倾斜面逸出,进而提高SDG-LED的光输出功率和提取效率。

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