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基于AlGaN的深紫外倒装芯片发光二极管的光提取效率控制:与基于InGaN的可见光倒装芯片发光二极管的比较

Light-extraction efficiency control in AlGaN-based deep-ultraviolet flip-chip light-emitting diodes: a comparison to InGaN-based visible flip-chip light-emitting diodes.

作者信息

Lee Keon Hwa, Park Hyun Jung, Kim Seung Hwan, Asadirad Mojtaba, Moon Yong-Tae, Kwak Joon Seop, Ryou Jae-Hyun

出版信息

Opt Express. 2015 Aug 10;23(16):20340-9. doi: 10.1364/OE.23.020340.

Abstract

We study light-extraction efficiency (LEE) of AlGaN-based deep-ultraviolet light-emitting diodes (DUV-LEDs) using flip-chip (FC) devices with varied thickness in remaining sapphire substrate by experimental output power measurement and computational methods using 3-dimensional finite-difference time-domain (3D-FDTD) and Monte Carlo ray-tracing simulations. Light-output power of DUV-FCLEDs compared at a current of 20 mA increases with thicker sapphire, showing higher LEE for an LED with 250-μm-thick sapphire by ~39% than that with 100-μm-thick sapphire. In contrast, LEEs of visible FCLEDs show only marginal improvement with increasing sapphire thickness, that is, ~6% improvement for an LED with 250-μm-thick sapphire. 3D-FDTD simulation reveals a mechanism of enhanced light extraction with various sidewall roughness and thickness in sapphire substrates. Ray tracing simulation examines the light propagation behavior of DUV-FCLED structures. The enhanced output power and higher LEE strongly depends on the sidewall roughness of the sapphire substrate rather than thickness itself. The thickness starts playing a role only when the sapphire sidewalls become rough. The roughened surface of sapphire sidewall during chip-separation process is critical for TM-polarized photons from AlGaN quantum wells to escape in lateral directions before they are absorbed by p-GaN and Au-metal. Furthermore, the ray tracing results show a reasonably good agreement with the experimental result of the LEE.

摘要

我们通过实验输出功率测量以及使用三维有限差分时域(3D-FDTD)和蒙特卡罗光线追踪模拟的计算方法,研究了基于AlGaN的深紫外发光二极管(DUV-LED)的光提取效率(LEE),这些DUV-LED采用倒装芯片(FC)器件,剩余蓝宝石衬底的厚度各不相同。在20 mA电流下比较的DUV-FCLED的光输出功率随着蓝宝石变厚而增加,对于蓝宝石厚度为250μm的LED,其LEE比蓝宝石厚度为100μm的LED高约39%。相比之下,可见FCLED的LEE仅随着蓝宝石厚度增加有少量提高,即蓝宝石厚度为250μm的LED提高约6%。3D-FDTD模拟揭示了蓝宝石衬底中不同侧壁粗糙度和厚度增强光提取的机制。光线追踪模拟研究了DUV-FCLED结构的光传播行为。增强的输出功率和更高的LEE很大程度上取决于蓝宝石衬底的侧壁粗糙度而非厚度本身。只有当蓝宝石侧壁变得粗糙时,厚度才开始起作用。芯片分离过程中蓝宝石侧壁的粗糙表面对于来自AlGaN量子阱的TM偏振光子在被p-GaN和金金属吸收之前向横向逃逸至关重要。此外,光线追踪结果与LEE的实验结果显示出合理的良好一致性。

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