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用二氧化钛和二氧化钛-硅复合材料去除抗生素四环素。

Remotion of the antibiotic tetracycline by titania and titania-silica composed materials.

机构信息

INQUISUR, Departamento de Química, Universidad Nacional del Sur, Av. Alem 1253, 8000 Bahía Blanca, Argentina.

出版信息

J Hazard Mater. 2011 Sep 15;192(3):1597-608. doi: 10.1016/j.jhazmat.2011.06.082. Epub 2011 Jul 2.

Abstract

Removal of the antibiotic tetracycline (TC) by TiO(2) and the mesoporous binary system TiO(2)-SiO(2) have been studied in batch experiments by performing adsorption isotherms/kinetics and photodegradation kinetics under different conditions of pH, supporting electrolyte concentration, temperature, adsorbent amount, and TiO(2)-loading. On the one hand, the adsorption of TC on the studied materials is strongly dependent on pH, increasing as pH decreases. The adsorption mechanism, controlled by diffusion processes, is strongly related to electrostatic attractions and H-bond formations mainly between amide, carbonylic and phenolic groups of the antibiotic and the functional groups of TiO(2). The adsorption capacity at constant pH increases in the order TiO(2)<TiO(2)-SiO(2) mainly due to the highly surface area that the silica offers and to the homogenously dispersion of the TiO(2) nanocrystallites. On the other hand, the photodegradation rate is affected by the presence of the studied materials at several pH, although its photocatalytic activities are more important at pH 7 or lower. The photodegradation mechanisms seem to be related to the formation of OH radicals which are responsible for the decomposition of TC. The composed titania-silica materials might act not only as an excellent adsorbent but also act as an alternative photocatalyst for pollution control.

摘要

采用吸附等温线/动力学和光降解动力学实验,研究了 TiO2 和介孔二元体系 TiO2-SiO2 对四环素(TC)的去除。实验在不同条件下进行,包括 pH、支持电解质浓度、温度、吸附剂用量和 TiO2 负载量。一方面,TC 在研究材料上的吸附强烈依赖于 pH,随着 pH 的降低而增加。吸附机制受扩散过程控制,主要与抗生素的酰胺、羰基和酚基与 TiO2 官能团之间的静电吸引和 H 键形成有关。在恒定 pH 下,吸附容量的顺序为 TiO2<TiO2-SiO2,主要是由于二氧化硅提供的高表面积和 TiO2 纳米晶的均匀分散。另一方面,光降解速率受研究材料在几种 pH 值下的存在影响,尽管其光催化活性在 pH 7 或更低时更为重要。光降解机制似乎与 OH 自由基的形成有关,OH 自由基是 TC 分解的原因。组成的二氧化钛-二氧化硅材料不仅可以作为一种优良的吸附剂,而且可以作为一种替代的光催化剂用于污染控制。

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