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碲化镓中缺陷态的理论研究。

Theoretical studies of defect states in GaTe.

作者信息

Rak Zs, Mahanti S D, Mandal Krishna C, Fernelius Nils C

机构信息

Department of Physics and Astronomy, Michigan State University, East Lansing, MI 48824, USA.

出版信息

J Phys Condens Matter. 2009 Jan 7;21(1):015504. doi: 10.1088/0953-8984/21/1/015504. Epub 2008 Dec 1.

Abstract

Using first principle electronic structure calculations within density functional theory and the supercell model, we have investigated the nature and formation energies of defect states associated with Ga and Te vacancies and Ge and Sn substitutional impurities in GaTe. We have also calculated the band structure of pure GaTe for comparison with systems with defects and also to find out the importance of spin-orbit interaction (SOI) on its band structure. We find that the top valence band at the Γ-point shifts up in energy by ∼0.1 eV due to the mixing of Te p(x)-p(y) and p(z) bands, this splitting being considerably smaller than in atoms where it is ∼0.8 eV. From an analysis of charge densities and band structures associated with the defect states, we find that most of them are strongly localized and lie deep in the band gap region. The calculated binding energy of the deep defect state and the ε(-1/-2) transition level associated with the Ga vacancy appears to be in good agreement with experiment. Formation energy calculations suggest that V(Ga) is the preferred intrinsic defect in GaTe.

摘要

利用密度泛函理论中的第一性原理电子结构计算和超胞模型,我们研究了与GaTe中Ga和Te空位以及Ge和Sn替代杂质相关的缺陷态的性质和形成能。我们还计算了纯GaTe的能带结构,以便与有缺陷的体系进行比较,并找出自旋轨道相互作用(SOI)对其能带结构的重要性。我们发现,由于Te的p(x)-p(y)和p(z)能带混合,Γ点处的最高价带能量上移约0.1 eV,这种分裂比原子中的分裂小得多,原子中的分裂约为0.8 eV。通过对与缺陷态相关的电荷密度和能带结构的分析,我们发现它们中的大多数都强烈局域化,并且位于带隙区域深处。计算得到的与Ga空位相关的深缺陷态的结合能和ε(-1/-2)跃迁能级似乎与实验结果吻合良好。形成能计算表明,V(Ga)是GaTe中首选的本征缺陷。

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