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在 230 至 350nm 之间的紫外吸收截面和在 308nm 时 CF3CH2CHO 的光解量子产率的压力依赖性。

UV absorption cross sections between 230 and 350 nm and pressure dependence of the photolysis quantum yield at 308 nm of CF3CH2CHO.

机构信息

Departamento de Química Física, Facultad de Ciencias Químicas, Universidad de Castilla-La Mancha, Avda. Camilo José Cela, s/n, 13071 Ciudad Real, Spain.

出版信息

Phys Chem Chem Phys. 2011 Sep 21;13(35):15936-46. doi: 10.1039/c1cp21368g. Epub 2011 Aug 5.

Abstract

Ultraviolet (UV) absorption cross sections of CF(3)CH(2)CHO were determined between 230 and 350 nm by gas-phase UV spectroscopy. The forbidden n → π* transition was characterized as a function of temperature (269-323 K). In addition, the photochemical degradation of CF(3)CH(2)CHO was investigated at 308 nm. The possible photolysis channels are: CF(3)CH(2) + HCO , CF(3)CH(3) + CO , and CF(3)CH(2)CO + H . Photolysis quantum yields of CF(3)CH(2)CHO at 308 nm, Φ(λ=308nm), were measured as a function of pressure (25-760 Torr of synthetic air). The pressure dependence of Φ(λ=308nm) can be expressed as the following Stern-Volmer equation: 1/Φ(λ=308nm) = (4.65 ± 0.56) + (1.51 ± 0.04) × 10(-18) [M] ([M] in molecule cm(-3)). Using the absorption cross sections and the photolysis quantum yields reported here, the photolysis rate coefficient of this fluorinated aldehyde throughout the troposphere was estimated. This calculation shows that tropospheric photolysis of CF(3)CH(2)CHO is competitive with the removal initiated by OH radicals at low altitudes, but it can be the major degradation route at higher altitudes. Photodegradation products (CO, HC(O)OH, CF(3)CHO, CF(3)CH(2)OH, and F(2)CO) were identified and also quantified by Fourier transform infrared spectroscopy. CF(3)CH(2)C(O)OH was identified as an end-product as a result of the chemistry involving CF(3)CH(2)CO radicals formed in the OH + CF(3)CH(2)CHO reaction. In the presence of an OH-scavenger (cyclohexane), CF(3)CH(2)C(O)OH was not detected, indicating that channel (R1c) is negligible. Based on a proposed mechanism, our results provide strong evidences of the significant participation of the radical-forming channel (R1a).

摘要

通过气相紫外光谱法在 230 至 350nm 范围内测定了 CF(3)CH(2)CHO 的紫外吸收截面。非禁阻的 n→π*跃迁随温度(269-323K)的变化而被描绘。此外,还在 308nm 下研究了 CF(3)CH(2)CHO 的光化学降解。可能的光解通道有:CF(3)CH(2) + HCO ,CF(3)CH(3) + CO ,和 CF(3)CH(2)CO + H 。在 308nm 下,CF(3)CH(2)CHO 的光解量子产率 Φ(λ=308nm)作为压力(25-760 托合成空气)的函数进行了测量。Φ(λ=308nm)的压力依赖性可以用以下 Stern-Volmer 方程表示:1/Φ(λ=308nm) = (4.65 ± 0.56) + (1.51 ± 0.04)×10(-18)[M] ([M]以分子 cm(-3)计)。使用本文报道的吸收截面和光解量子产率,估算了这种含氟醛在整个对流层中的光解速率系数。该计算表明,CF(3)CH(2)CHO 的对流层光解在低空与 OH 自由基引发的去除作用竞争,但在较高高度处可能是主要的降解途径。通过傅里叶变换红外光谱鉴定并定量了光降解产物(CO、HC(O)OH、CF(3)CHO、CF(3)CH(2)OH 和 F(2)CO)。由于涉及 OH + CF(3)CH(2)CHO 反应中形成的 CF(3)CH(2)CO 自由基的化学作用,鉴定出 CF(3)CH(2)C(O)OH 为终产物。在存在 OH 清除剂(环己烷)的情况下,未检测到 CF(3)CH(2)C(O)OH,表明通道(R1c)可以忽略不计。基于提出的机制,我们的结果提供了自由基形成通道(R1a)显著参与的有力证据。

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