Butler J E, Mankelevich Y A, Cheesman A, Ma Jie, Ashfold M N R
Chemistry Division, Naval Research Laboratory, Washington, DC 20375, USA.
J Phys Condens Matter. 2009 Sep 9;21(36):364201. doi: 10.1088/0953-8984/21/36/364201. Epub 2009 Aug 19.
In this paper we review and provide an overview to the understanding of the chemical vapor deposition (CVD) of diamond materials with a particular focus on the commonly used microwave plasma-activated chemical vapor deposition (MPCVD). The major topics covered are experimental measurements in situ to diamond CVD reactors, and MPCVD in particular, coupled with models of the gas phase chemical and plasma kinetics to provide insight into the distribution of critical chemical species throughout the reactor, followed by a discussion of the surface chemical process involved in diamond growth.
在本文中，我们回顾并概述了对金刚石材料化学气相沉积（CVD）的理解，特别关注常用的微波等离子体激活化学气相沉积（MPCVD）。涵盖的主要主题包括对金刚石CVD反应器，特别是MPCVD的原位实验测量，以及气相化学和等离子体动力学模型，以深入了解整个反应器中关键化学物种的分布，随后讨论金刚石生长过程中涉及的表面化学过程。
