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硅/铜(110)表面合金的光学反射各向异性

Optical reflectance anisotropy of the Si/Cu(110) surface alloy.

作者信息

Martin D S

机构信息

Department of Physics and Surface Science Research Centre, University of Liverpool, L69 7ZE, UK.

出版信息

J Phys Condens Matter. 2009 Oct 7;21(40):405003. doi: 10.1088/0953-8984/21/40/405003. Epub 2009 Sep 8.

DOI:10.1088/0953-8984/21/40/405003
PMID:21832405
Abstract

Measurements of the optical reflectance anisotropy (RA) of the Si/Cu(110)-c(2 × 2) surface alloy are reported. Significant changes in the RA response of Cu(110) are observed upon the formation of the surface alloy, and with the growth of one-dimensional (1D) anisotropic Si chains on top of the surface alloy. The transitions between the surface states near the Fermi level (E(F)) at the [Formula: see text] symmetry point on the clean Cu(110) surface are no longer observed in RA spectra of 0.3 ML Si coverage. Peaks in RA spectra arising from transitions between surface-modified bands near E(F) at the L point are found to be sensitive to the formation of the surface alloy. The RA response of the c(2 × 2) surface alloy from 3.0 to 5.5 eV is simulated using a simple three-phase derivative model. The addition of an overlayer phase to this model makes it possible to simulate higher coverage Si/Cu RA profiles where 1D Si chains cover the surface alloy. The success of the models, in which discrete phases contribute to the RA response, supports the view that the Si chains grow on top of the intact c(2 × 2) alloy. Depositing between 1.2 and 1.8 ML Si results in no change to the RA spectroscopy signal, indicating that the signal remains sensitive to the covered alloy interface.

摘要

报道了对Si/Cu(110)-c(2×2)表面合金的光反射率各向异性(RA)的测量结果。在表面合金形成时,以及在表面合金顶部生长一维(1D)各向异性Si链时,观察到Cu(110)的RA响应发生了显著变化。在0.3 ML Si覆盖度的RA光谱中,不再观察到清洁Cu(110)表面在[公式:见正文]对称点处费米能级(E(F))附近表面态之间的跃迁。发现L点处E(F)附近表面改性能带之间跃迁产生的RA光谱峰对表面合金的形成敏感。使用简单的三相导数模型模拟了c(2×2)表面合金在3.0至5.5 eV范围内的RA响应。向该模型中添加一个覆盖层相,使得有可能模拟更高覆盖度的Si/Cu RA分布,其中1D Si链覆盖表面合金。离散相有助于RA响应的模型的成功,支持了Si链在完整的c(2×2)合金顶部生长的观点。沉积1.2至1.8 ML Si之间不会导致RA光谱信号发生变化,这表明该信号对被覆盖的合金界面仍然敏感。

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