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单晶 InN 纳米线的电子输运机制与光电流产生

Electronic transport mechanism and photocurrent generations of single-crystalline InN nanowires.

作者信息

Lee Sunghun, Lee Wonjoo, Seo Kwanyong, Kim Jinhee, Han Sung-Hwan, Kim Bongsoo

机构信息

Department of Chemistry, KAIST, 335 Gwahangno, Yuseong-gu, Daejeon 305-701, Korea. Nano-devices Research Center, Korea Research Institute of Standards and Science (KRISS), Doryong-dong, Yuseong-gu, Daejeon 305-340, Korea.

出版信息

Nanotechnology. 2008 Oct 15;19(41):415202. doi: 10.1088/0957-4484/19/41/415202. Epub 2008 Sep 3.

Abstract

Nanodevices using individual indium nitride nanowires are fabricated by e-beam lithography. The nanowires have diameters of 40-80 nm, lengths up to several tens of micrometres and single-crystalline nature. We observed ohmic I-V behaviour of InN nanowires above nearly 100 K, which is consistent with the pinning Fermi level of the metal electrode near the conduction band edge of InN nanowire. At low temperatures, the device shows typical semiconductor behaviour along with a quantum tunnelling effect through the Schottky barrier rather than thermally activated transport. The activation energy calculated above and below 80 K is 28.2 and 5.08 meV, respectively. We have also fabricated a photocurrent generation device using InN nanowires. The photocurrent of an acceptor-sensitizer dyad with di-(3-aminopropyl)-viologen (DAPV) and a Ru complex on an InN nanowires/ITO plate was 8.3 nA cm(-2), which increased by 62.7% compared to that without InN nanowire layers.

摘要

使用单个氮化铟纳米线的纳米器件是通过电子束光刻技术制造的。这些纳米线直径为40 - 80纳米,长度可达几十微米,且具有单晶性质。我们观察到氮化铟纳米线在接近100 K以上呈现欧姆I - V行为,这与金属电极的费米能级钉扎在氮化铟纳米线导带边缘附近的情况一致。在低温下,该器件表现出典型的半导体行为,同时存在通过肖特基势垒的量子隧穿效应,而非热激活传输。在80 K以上和以下计算得到的激活能分别为28.2和5.08毫电子伏特。我们还使用氮化铟纳米线制造了一个光电流产生器件。在氮化铟纳米线/ITO板上,含有二-(3 - 氨丙基)-紫精(DAPV)和钌配合物的受体 - 敏化剂二元体系的光电流为8.3 nA cm(-2),与没有氮化铟纳米线层的情况相比增加了62.7%。

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