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Ti 表面扩散导致 Ti/ZnO 纳米棒异质结构的近带边发光增强。

Enhanced near band edge luminescence of Ti/ZnO nanorod heterostructures due to the surface diffusion of Ti.

机构信息

Department of Solid State Physics, Indian Association for the Cultivation of Science, Jadavpur, Kolkata 700032, India.

出版信息

Nanoscale. 2011 Oct 5;3(10):4427-33. doi: 10.1039/c1nr10937e. Epub 2011 Sep 19.

Abstract

Information on the mechanistic differences in the luminescence properties of Ti/ZnO nanorods (NRs) has been obtained through the preparation of heterostructures by (a) varying the thickness of Ti from 1 nm to 20 nm keeping the substrate temperature at 400 °C, (b) varying the substrate temperature from room temperature (RT) to 500 °C while keeping the metal thickness constant at 10 nm and (c) annealing the RT Ti sputtered NRs at temperatures of 400 °C and 500 °C. The photoluminescence (PL) spectra show that the near band edge luminescence of ZnO in the ultraviolet (UV) region is enhanced as the thickness of Ti increases up to 5 nm and, thereafter, it falls. Sputtering of Ti on ZnO NRs at RT does not cause any UV enhancement but when sputtered at and above 400 °C, the UV intensity is enhanced. Annealing of RT Ti sputtered NRs at and above 400 °C also results in the enhancement of the UV peak, although with a lesser magnitude. Analysis of the PL results, supported by X-ray diffraction, field emission scanning electron microscopy, elemental mapping, high resolution transmission electron microscopy, Fourier transform infrared spectroscopy and electrical I-V measurement results, show a clear indication that the surface diffusion of Ti causes a reduction in the surface defects.

摘要

通过制备异质结构,获得了 Ti/ZnO 纳米棒 (NRs) 发光性质的机制差异信息:(a) 在保持基底温度为 400°C 的情况下,将 Ti 的厚度从 1nm 变化至 20nm;(b) 在保持金属厚度为 10nm 不变的情况下,将基底温度从室温 (RT) 变化至 500°C;(c) 将 RT 下溅射的 Ti NRs 在 400°C 和 500°C 下退火。光致发光 (PL) 光谱表明,随着 Ti 厚度增加到 5nm,ZnO 在紫外 (UV) 区域的近带边发光增强,此后则下降。RT 下溅射 Ti 到 ZnO NRs 上不会引起任何 UV 增强,但在 400°C 及以上溅射时,UV 强度增强。RT 下溅射的 Ti 被退火至 400°C 及以上也会增强 UV 峰,尽管强度较小。PL 结果的分析,得到了 X 射线衍射、场发射扫描电子显微镜、元素映射、高分辨率透射电子显微镜、傅里叶变换红外光谱和 I-V 电测量结果的支持,表明 Ti 的表面扩散明显导致表面缺陷减少。

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