Department of Solid State Physics, Indian Association for the Cultivation of Science, Jadavpur, Kolkata 700032, India.
Nanoscale. 2011 Oct 5;3(10):4427-33. doi: 10.1039/c1nr10937e. Epub 2011 Sep 19.
Information on the mechanistic differences in the luminescence properties of Ti/ZnO nanorods (NRs) has been obtained through the preparation of heterostructures by (a) varying the thickness of Ti from 1 nm to 20 nm keeping the substrate temperature at 400 °C, (b) varying the substrate temperature from room temperature (RT) to 500 °C while keeping the metal thickness constant at 10 nm and (c) annealing the RT Ti sputtered NRs at temperatures of 400 °C and 500 °C. The photoluminescence (PL) spectra show that the near band edge luminescence of ZnO in the ultraviolet (UV) region is enhanced as the thickness of Ti increases up to 5 nm and, thereafter, it falls. Sputtering of Ti on ZnO NRs at RT does not cause any UV enhancement but when sputtered at and above 400 °C, the UV intensity is enhanced. Annealing of RT Ti sputtered NRs at and above 400 °C also results in the enhancement of the UV peak, although with a lesser magnitude. Analysis of the PL results, supported by X-ray diffraction, field emission scanning electron microscopy, elemental mapping, high resolution transmission electron microscopy, Fourier transform infrared spectroscopy and electrical I-V measurement results, show a clear indication that the surface diffusion of Ti causes a reduction in the surface defects.
通过制备异质结构,获得了 Ti/ZnO 纳米棒 (NRs) 发光性质的机制差异信息:(a) 在保持基底温度为 400°C 的情况下,将 Ti 的厚度从 1nm 变化至 20nm;(b) 在保持金属厚度为 10nm 不变的情况下,将基底温度从室温 (RT) 变化至 500°C;(c) 将 RT 下溅射的 Ti NRs 在 400°C 和 500°C 下退火。光致发光 (PL) 光谱表明,随着 Ti 厚度增加到 5nm,ZnO 在紫外 (UV) 区域的近带边发光增强,此后则下降。RT 下溅射 Ti 到 ZnO NRs 上不会引起任何 UV 增强,但在 400°C 及以上溅射时,UV 强度增强。RT 下溅射的 Ti 被退火至 400°C 及以上也会增强 UV 峰,尽管强度较小。PL 结果的分析,得到了 X 射线衍射、场发射扫描电子显微镜、元素映射、高分辨率透射电子显微镜、傅里叶变换红外光谱和 I-V 电测量结果的支持,表明 Ti 的表面扩散明显导致表面缺陷减少。