Obara Go, Maeda Naoki, Miyanishi Tomoya, Terakawa Mitsuhiro, Nedyalkov Nikolay N, Obara Minoru
School of Integrated Design Engineering, Keio University, 3-14-1, Hiyoshi, Yokohama-shi, 223-8522, Japan.
Opt Express. 2011 Sep 26;19(20):19093-103. doi: 10.1364/OE.19.019093.
We present experimental and theoretical results on plasmonic control of far-field interference for regular ripple formation on semiconductor and metal. Experimental observation of interference ripple pattern on Si substrate originating from the gold nanosphere irradiated by femtosecond laser is presented. Gold nanosphere is found to be an origin for ripple formation. Arbitrary intensity ripple patterns are theoretically controllable by depositing desired plasmonic and Mie scattering far-field pattern generators. The plasmonic far-field generation is demonstrated not only by metallic nanostructures but also by the controlled surface structures such as ridge and trench structures on various material substrates.
我们展示了关于半导体和金属上规则波纹形成的远场干涉的等离子体控制的实验和理论结果。给出了飞秒激光照射金纳米球在硅衬底上产生干涉波纹图案的实验观察结果。发现金纳米球是波纹形成的起源。通过沉积所需的等离子体和米氏散射远场图案发生器，理论上可以控制任意强度的波纹图案。等离子体远场的产生不仅通过金属纳米结构得到证明，还通过各种材料衬底上的受控表面结构（如脊和沟槽结构）得到证明。
